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  • NMOS Fabrication

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    Roshini Vannoj
    18 views4 pages
    1) The document describes steps in a semiconductor fabrication process involving deposition, lithography, and doping of layers on a substrate. 2) Key steps include depositing silicon dioxide and polysilicon layers, patterning these layers through photolithography to create windows, and doping the substrate to create n-type and p-type regions. 3) The process is aimed at fabricating transistors on the substrate by creating isolated n-type and p-type regions for the source, drain, and channel.

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    1) The document describes steps in a semiconductor fabrication process involving deposition, lithography, and doping of layers on a substrate. 2) Key steps include depositing silicon dioxide and polysilicon layers, patterning these layers through photolithography to create windows, and doping the substrate to create n-type and p-type regions. 3) The process is aimed at fabricating transistors on the substrate by creating isolated n-type and p-type regions for the source, drain, and channel.

    Copyright:

    © All Rights Reserved
    Download as PDF, TXT or read online from Scribd
    Flag for inappropriate content
    18 views4 pages

    NMOS Fabrication

    Uploaded by

    Roshini Vannoj
    1) The document describes steps in a semiconductor fabrication process involving deposition, lithography, and doping of layers on a substrate. 2) Key steps include depositing silicon dioxide and polysilicon layers, patterning these layers through photolithography to create windows, and doping the substrate to create n-type and p-type regions. 3) The process is aimed at fabricating transistors on the substrate by creating isolated n-type and p-type regions for the source, drain, and channel.

    Copyright:

    © All Rights Reserved
    Download as PDF, TXT or read online from Scribd
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