Polymer(Korea), Vol. 29, No.

3, pp 242-247, 2005

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Advanced Materials and Application Research Laboratory,
Korea Electrotechnology Research Institute, Changwon 641-120, Korea
*Department of Forest Products, College of Agriculture and Life Science,
Seoul National University, Seoul 151-921, Korea
(Received November 15, 2004;accepted April 27, 2005)

S¨Ü ²²Ê2 :Ê Û®, ²²Ê2 :Ê/:Ö® ¾š, n§2Z G® n§ÆÊ& †Ò ¦ Û®® ²²Ê2
:Ê/:Ö êš ¿‡®V:. ÊB² Κ Êÿ®B ê-z ª[š rÆ®B ’W ª¯W ‡š Æ®V:. N 
R 1034A ²²Ê2 :ʲֆ   ê-z ª[® g_WR ²Ê6‡– HSA ê-z ª[& š®B n®
V:. N6 1034A ²²Ê2 :ʲֆ   ê-z ª[– 550 ×¢ JÚÊÊ žk®V6 methyltrimeth-
oxysilane(MTMS) ¾Ê óV¶n³ ª[® ¦.V ¦" ¢:. 1034A ²²Ê2 :Ê ê-z ª[® ê
MTMS® ¾ óV& †Ò fâ®V’î HSAê Æ Wûš q ®:. ²Ê&^ê MTMS ¾ óV– ªÞ
ZnW’² fâ®ê ûš JV:.
G
Abstract:Two kinds of colloidal silica(CS)/silane sol solutions were prepared in variation with synthesizing parameters
such as kinds of CS, ratio of CS to silane and reaction time. Such sol solutions were obtained from 1034A CS/methyl-
trimethoxysilane(MTMS) and HSA CS/MTMS solutions. In the case of 1034A CS/MTMS CS/silane sol, coating film had
high contact angle and more enhanced flat surface than those in the case of HSA CS/MTMS sol. In the case of thermal
stability, thermal dissociation of 1034A CS/MTMS sol did not occur up to 550 ×. The thickness of coating film obtained
from 1034A CS/MTMS sol increased with increasing the amount of MTMS. The hardness of coating films obtained from
1034A CS/MTMS sol decreased with increasing the amount of MTMS. Surface free energy of CS/silane sol-gel coating
film decreased with increasing amount of MTMS.

Keywords: sol-gel, colloidal silica, tetramethoxysilane, methyltrimethoxysilane, coating film.

1.# g«# †V ê 4VÎ tetramethoxysilane(TMOS)® ¾š& †Ò ê ÿ·

’Êî ¢²& žk®â Úr îÎ Ûæ® ²²Ê2 :Ê(colloi-
dal silica, CS)ê 3 fê 4V® ¢«2 :Ö:R ê-z n§’² v
& V¢ vŠ† ’‡ K¿"® ¿‡Ê Vû®:. ÊF K¿
":– ª[® , ‡,  ª[‡,
‚Û®B ²Ê r e JŽÿ® ª[r fê jΪ â² Êÿn
6 Þ:.
ê-z n§& Wûš N®ê Îæ²ê , n§~– 2Z, ÿ ® n§2Z Gš Îæ² ®B ê:š ¿‡®6 zªr ª[® 
ã, _:Û® GÊ Þ’Æ, VnÚÊn§R ë¿n§š nn²:.1,2
:Ö:Ê ‡ÆÊ ®&r :ւ² VnÚÊV n6 ë¿n§š
® ²Ê&^V OÞ :Êâ r:.3 :Êê > ²Ê&r ª
¯W’² n§¶ ÊÆ Ö’ëâê :ւ® ë¿n§& ®Ê r
3®² :Ê® ¾& †Ò zªv ¢ ֒ëâ kê OÞ
~ÊV ò:. NFV ®Ê zªv ¢ :Ê ÛæZ® KOš ²
J‡ GÊ n®6 ⪮† Z®B †V :Î :Ê Ûæ:® W^² Æ¿Ê šê
®:.
N FÂ&rê CS Û® e CS/TMOS& V² MTMS® ¾š, ê
‡:š Æ®V:.

Demo
Æ& silsesquioxaneÊ ": ê /ÛZ® n§& š®B :Ê
²ÊR® n§kî :Ö&r ªN†Ò V 3VÎ MTMS– v†
2. /#

2.1 'È# Z# ô|ð£#

CSê (R)vö® Ludox HSA(6kÚ30%, particle size12
† To whom correspondence should be addressed. E-mail: dpkang@keri.re.kr nm, pH4.2)– öª® Nalco 1034A(6kÚ34%, particle size20

242
 ²²Ê2 :ʖ ¢«2 :Ö® ê-z ª[r ¿‡R ‡ 243

Table 1. The Reaction Condition of Sol-Gel Process

Colloidal Silica Silane
Kind of CS pH 1 Step reaction 2 Step reaction
(HAS/1034A) (TMOS)
MTMS 60
HSA 100 TMOS 30 MTMS 80
4.2
addition of EtOH (12 nm) EtOH 30 MTMS 100
MTMS 120
reaction(30 ×, 5 hrs) MTMS 60
1034A 100 TMOS 30 MTMS 80
2.8
(20 nm) EtOH 30 MTMS 100
Silane MTMS 120
(MTMS)
Table 2. Sol Species Synthesized from CS HSA and Different MTMS
reaction(6»72 hrs) Contents
Species MTMS Time(hr) Formation of coating film
Colloidal Silica Sol HSA60-6 60 6 hazy
HSA60-24 60 24 a little hazy
coating(dipping) HSA60-48 60 48 transparence
HSA60-72 60 72 transparence
drying(60 ×, 1 hr)
HSA80-6 80 6 hazy
curing(300 ×, 3 hrs) HSA80-24 80 24 a little hazy
HSA80-48 80 48 transparence
HSA80-72 80 72 transparence
Formation of Coating Film HSA100-6 100 6 hazy
HSA100-24 100 24 a little hazy
HSA100-48 100 48 transparence
Scheme 1. Schematic representation of coating films.
HSA100-72 100 72 transparence
HSA120-6 120 6 hazy
nm, pH2.8)Ò ÿ®V:. :֒² MTMS– TMOSÒ Toshiba® HSA120-24 120 24 a little hazy
HSA120-48 120 48 transparence
TSL 8113R TSL 8114Ò ÿ®V:. ÿ:²ê &‚(EtOH, Samchun)
HSA120-72 120 72 transparence
š ÿ®V6, êš ¿‡®êÆ Êÿr û®ê ~r – ¦nã
 Æ^Ê Vû² n§ÆÒ ÿ®V:. Table 3. Sol Species Synthesized from CS 1034A and Different MTMS
2.2 Ÿ2ß# ´|# Z# Ï£# gÜ# Contents
> CS²r HSA– 1034A& VÊr WW ¿‡:.š ß®V Species MTMS Time(hr) Formation of coating film
:. W CS 100& VÊr 1>² TMOS 30R EtOH 30š þV®6 1034A60-6 60 6 hazy
52Z /ž n§ , 2>² MTMS 60, 80, 100, 120 mL šÒ B 1034A60-24 60 24 transparence
1034A60-48 60 48 transparence
®B þV®B 6, 24, 48, 722Z n§2r êš rÆ®V:. n§–
1034A60-72 60 72 transparence
30 × ~ÆÊ&r 300 rpm ¦nã² ßn:. ª[ šÚ– 1034A80-6 80 6 hazy
dip coaterÒ Êÿ®B slide glassÒ 4 cm/min ã² ®k-2úÊ 1034A80-24 80 24 transparence
r rÆ®V:. ª[r .b– 60 ×&r 12Z /ž ÊÆ®V’Æ 1034A80-48 80 48 transparence
1034A60-72 80 72 transparence
300 ×&r 32Z /ž VJ ª®V:(Scheme 1). ê® ¿‡ÆÊ
1034A100-6 100 6 hazy
R ª[ 2 šÚk‡ +:š Table 1, 2, 3& î :. 1034A100-24 100 24 transparence
2.3 \TL# l` 1034A100-48 100 48 transparence
Dynamic contact angle meter(Surface and Electro-Optics)Ò ÿ®B 1034A100-72 100 72 transparence
g_Wš wk®V:. 2 ²Ê& þ ~ ’® ç– 10 µLÊ’ 1034A120-6 120 6 hazy
1034A120-24 120 24 transparence
Æ 10^ & g_Wš wk®V:. MTMS® þVR n§2ZÊ 1034A120-48 120 48 transparence
:Î 2:& V² g_Wš wk®B W ª[šÚ® rn‡š š 1034A120-72 120 72 transparence
¦®V:.
2.4 Urxjkqhvv# l`#
²Ê® 6ƶ†(Ra)ê Alpha-step 500 surface profilerÒ ÿ®B ~®Êr wk®V:. TGA® wkh’²Ö† MTMS® ¾&
scan length: 2000 µm, vertical range/resolution: 300 µm/25A, scan time: †Î ª[’® ÚÊ~Ò š¦®V:.
10 sec, scan speed: 20 µm/s, sampling rate: 50 Hz® Æʒ² wkn 2.6 VHP# ›# l`#
:. Ra h– : Þ wk² hš 6®B :. 1034A CS&r 482Z n§2þ Κ v²Ê& dip ª[²
2.5 ÿ?|# l`# 2"Ò ^>®B MTMS ¾& †Î ª[® ¦.Ò Hitachi
1034 A&r 482Z n§2þ êš ¢>NÚ ŽÒ& ª[® ® S-2700š ÿ®B wk®V:.
B 60 ×&r ÊÆ2þ  TGA(Dupont)Ò ÿ®B 20 ×/min’² 2.7 Shqgxoxp#Kdugqhvv# l`#

Polymer(Korea), Vol. 29, No. 3, 2005

244
k/šákþJážÛáÛÎráÊ2Rá²á–Zg

HSA/1034A CS&r 242Z n§2þ êš v²Ê& dip ª[ Table 5. Contact Angle of CS 1034A/TMOS/MTMS Sol-Gel Coating
Films
®B MTMS ¾& †Î ²Ê® pendulum hardness hš Konig
G O>Z°P
Pendulum Hardness Tester(Sheen)Ò ÿ®B Æ®V:.
MTMS contents
2.8 Plfurkdugqhvv# l` Reaction time
60% 80% 100% 120%
HSA/1034A CS&r 242Z n§2þ êš v²Ê& dip ª[ 6 hr 85.15 86.39 87.14 88.35
24 hr 82.13 85.41 87.76 88.65
®B MTMS ¾& †Î ²Ê® microhardness hš H100 XYp
48 hr 82.63 84.58 83.41 83.48
Microhardness Tester(Fischerscope )Ò ÿ®B Æ®V:. wk 72 hr 85.44 86.66 87.25 88.54
ë– 10 mN®  20^ /ž loadingR unloadingš ®B plastic
hardness(HUpl)– elastic portion hš wk®V:. Ê ’² Ê/®B Ún Þ6ÒV ~’²¾ ²Êƶ†®
2.9 I# l`# óV– ªÞ g_WÊ óV®ê ْ² JÎ:. MTMS® ¾Ê
HSA/1034A CS&r 242Z n§2þ êš v²Ê& dip ª[ 60&r 80’² óV®B VÚæ‡ :Ö® çÊ óV®Ê, ²Ê’²
®B MTMS ¾& †Î ²Ê® ~Ò Spectrophotometer SP Únê :Ö óV®B g_WÊ ®" 80&r 120¢
820 λ(Techkon)Ò ÿ®B 2® L*(lightness), a* (redness), b*(yellow- ê š¦W žkr g_Wš î ê ْ² Jš, zª Z& ²
ness)Ò Æ®B ª[®† ZR® ~(color difference)Ò wk®V ʒ² «n g_W& Wûš Rê :ÖÊ ²Ê&r Bªn
:. Ê ¢, slide glass– ª[ ® 2 þ¦ ‚Û®† ¢Ž& ~Ò ê ْ² JÎ:. n§Ê 242ZÒ ¢¢ê ZÊ vnÊr
wk¶ ¢ 2š 92.42·0.13® L*h, 2.47·0.03® a*hR -9.47· n§^†& ²Êƶ†V è– Ù’² Jš n§2ZR ªÞ Â
0.12® b* hš Vê ‡ Z& ¦6 ~Ò wk®V:. ‡":® Þ6ÒÊ ff Òê ْ² JÎ:. n§2ZÊ
2.10 §¿Ûk5 # l` 48R 722Z’² f~ Ž Ê, g_W® fW óVV ^nî,
242Z n§2þ êš v²Ê& dip ª[®B MTMS ¾& † :ւ 뿒:® ²Ê«Ê ‹6 ²Êƶ† Wû’² g_W
Î ²Ê® ²Êæv&^Ò wk®† ZÊ water, formamide, Ê OÞ Þžk² RÒ JÊ6 Þ:.
diiodomethaneš ÿ®B   g_W hš Lewis Acid/Base3& CS² 1034AÒ ÿ² ê® (Table 5), g_WÊ 82° Ê’²
VÛ®V:. g_W wk††ê Phoenix 300(Surface and Electro-Optics HSAÒ ÿ² J: Z W’² g_WÊ Æ Ùš ¢ n Þ:.
)š ÿ®V:. HSA CS(pH 4.2)& šÊ 1034A CS(pH 2.8)ê ÛæV Â6 ‡V
è:ê ~ÊV ÞêÆ pHV š , CS– :Ö® ’¿2 J r
3. ûG Z ë« 3Ê $š ÿÊJÊ ^†n§ãÒ :â ¶Êâ ®êÆ Wûš
Rš ْ² ^nÆ, n§ãV ¾Ò&’²¾ :Ö /ÛZ®
3.1 \TL n§R :ÖR CS ÊR® n§:Ê æ k Wûš q– R
ª[" ²Ê® g_W– ® ƶ†– ‡"® ²Ê&^ Ò Ù’² êkr:.
& ®Ê®êÆ CS Ûæ® ²Ê&^ê Ê~W ‡š V6 Þ MTMS ¾ óV– ªÞ ân‡® óV² g_WÊ ®6
’J: : ÂÆ CS ²Ê&r ªN†Ò V :ÖÊ ª[nE Þ’Æ Z WÎ g_WÊ žkn6 ÒVr ûš JÊ6 Þ:.
Ê Ê&r n§Ê Ò ò:Ê ²Ê&^ê Ââ š ÙÊ:. MTMS ¾Ê 100, 120ÊÊr n§2ZÊ 482ZÎ , HSAJ
g_WÊ 90 ° J: Æ ân‡ ²Êš V ’® ²ÊÊ Æ¶ Ž :ê 1034AÒ ÿ² ê® g_WÊ Ââ ®VêÆ ª[Ê®
r ²ÊWÊ óVr:Ê g_W– ª Ââ wkv ÙÊ6 ²n‡ ²Êƶ†V Ââ Wûš R6 Þ:. Ûæ® Â†V óV®Ê ²
²Êš V ’® ²ÊÊ Æ¶ Ê g_WÊ ª çšê Ù ÊW– Ââ fâ®Æ ²Ê® žkªÊ~® Û®– ç& †Ò z
’² n Þ:.  Æ– ²Ê&^® ~ÊV «În6 ÞêÆ, CS 1034A® 
CS² HSAÒ ÿ² ê® , :֒² MTMS"š ÿޚ ¢ V >‚ žkr zš k‡®V:.
J: TMOS/MTMSÒ ÿ®Vš ¢ TMOS® Wû’² ²Ê&^ 3.2 Urxjkqhvv#
V fâ®B Z W’² g_WÊ šê ٚ «Î² j Þ:.4,5 kª["&r ²Êƶ†ê "Ò Â‡®ê ‡Ú:® 6
Table 4ê CS HSA/TMOS/MTMS n§&r n§2ZR MTMS ‡& Ââ Wûš qê ْ² n Þ:. CS ²ÊR :ւ– ²n
¾& †Î z® g_Wš î ÙÊ:. n§2ZÊ 62Z’ ‡Ê6 :Ö e :Ö® n§ gZ : fê :֒² ²Êîr CS
² =– , û2Z n§2þ êJ: :ւªr kî ên§® :– ân‡ ²Êš VêÆ Ê:® VWÎ šî Ûæ †®
ßkV W :ÖÚæ:Ò ë¿Ê R² ßn6 CS Ûæ² 6‡& ®Ê ²Êƶ†V kn  ÙÊ:. :" ÎÊ v ²
ÊR® n§Ê šR ÖÚWÊ r k‡ 2, VÚæ :Ö:Ê ² Ê& ª[v ¢ ê ÿ·&r ²n‡Ê k² :ւÊî Ên§
Ê Wâ Ò ò CS:Ê v²Ê& ’V gR¶ ْ² JÎ:.
Table 4. Contact Angle of CS HSA/TMOS/MTMS Sol-Gel Coating
HSA n§&r® :.RÒ Figure 1& î :. MTMS®
Films
G O>Z°P þVÊ 60%² W– , n§2Z& †Ò ²Êƶ†V B®â
MTMS contents ®ê ٖ Ên§& ŽB¶ MTMS® çÊ W Ûæ:® ²Ê
Reaction time
60% 80% 100% 120% îr 2V Ââ :Î Ù:Ê KÊ®ê ْ² JÊÆ 60%&r
6 hr 77.77 81.14 80.06 81.56 80%² MTMS ¾Ê óV¶ ¢, K W’² ²ÊÊ ášê ٖ
24 hr 68.82 70.09 69.61 70.79
48 hr 67.30 70.64 60.57 63.20 6Òš Ê>êÆê ÒkÊ® :ÖÊ šê®:ê ٚ ®N²
72 hr 71.72 71.96 69.83 69.51 :. MTMS ¾Ê 100, 120%² $š ¢® û2Z n§&r ²ÊÊ

žVâ, \29Ì \3N, 2005T 

 ²²Ê2 :ʖ ¢«2 :Ö® ê-z ª[r ¿‡R ‡ 245

433#
0 433#
6 hr
24 hr
;3#
0 48 hr
72 hr
<8#

Weight(%)
93#
0
Ra

73#
0 <3# M T M S c o n te n ts
60%
80%
53#
0 100%
120%
;8#
3#
0 533#
200 733#
400 933#
600 8;33
00#
03#
# 93# ;3# 433# 453# Temperature(×)
MTMS Contents(%)
Figure 3. TGA thermogram of CS 1034A/TMOS/MTMS sol-gel coating
Figure 1. Roughness of CS HSA/TMOS/MTMS sol-gel coating films. films.

83#
6 hr
24 hr
73# 48 hr
72 hr

63#
Ra

53#

43#
60% 100%
3#
# 93# ;3# 433# 453# Figure 4. SEM images of CS 1034A/TMOS/MTMS sol-gel coating films.
MTMS Contents(%)

Figure 2. Roughness of CS 1034A/TMOS/MTMS sol-gel coating films.
á ®" MTMS ¾Ê 100%Ò ¢, 482Z n§&r ²Ê6
‡Ê šR n®V:. 242ZJ: 482Z n§2þ ª[®
²Ê6‡Ê ZnW’² n² ٖ žk² >Òš Ê>êÆ
æ k® n§2ZÊ šê¾š ®N²:. MTMS® ¾Ê 120%²
$– n§&rê n§2ZÊ Ž Ê ÛæZ® z"Ân§Ê
î®â Ò î 6ÚæªV ßnêÆ ÚæV Æ ÿ·Òn³ ²
Ê&^V óV®B ª[ 2 ÿ·Ê 6Ò² š Ê>êÆ Þ
ʎ ²Êƶ† kV óV®ê ْ² JÎ:. n§2Z& †Î
ª[® ~Ê&r n§2ZÊ 62Z’² =– , VÚæ‡ :
Ö®V «n ²Ê6‡Ê OÞ n®Êr MTMS® ¾Ê
óV¾& †Ò ²Êƶ† kV n®" 722Z’² n§2Z
Ê Ž Ê CS ²Ê&r z"Ân§Ê ãn Æ Ûæ² ‡
û®â n6 Ò&‡Ê î¶Æ 6Ò² k‡Ê ž nê ْ²
JÎ:. ʖ o– Z– HSAÒ ÿ² n§&r ª ¦2B
â îîÆ HSA CSÒ ÿ¶ ® ê ¿‡&rê MTMS ¾ k² «K2Zš
Ê 80&r 100%² êÂn6 n§2Z 482ZÊ WO¶ ْ²
JÎ:.
1034A CS&rê Figure 2&r îò RîR n§2ZR MTMS
¾® ÆÊ& Wûš q 6 ²Ê6‡Ê n®V:.
3.3 ÿ?|
TGAê Òkã² ~®Êr W ~ ŠâfâÒ ² "
® JÚÊ~Ò wk®B æ k® ~¢ žk®â ÿ¶
n ÞêÒ «Î®ê n>Ê:.6 TGA wk RÒ Figure 3& î
:. ª[  60 ×&r ÿ:"š órÊÆ®B wk² Ùʆ
¢Ž& 300 ×¢® Šâfâê ë¿(ª)n§Ê Ò îÊr ¢
²Êî nÚ® & †Î² ÙÊ6 550 × Ê&r r3®ê Š
âfâV ª["® JÚÊ& †Îr ْ² R n Þ:. CS/silane
ª[– 550 ×¢ ÚÊÊ î jÆ MTMS® ¾Ê 60%Î
, ÚÊ~V 600 × ÊΠْ² «În:. MTMS ¾Ê
óVvn³ v†† ‡ÚÊ óVn6, JÚÊ~ê š:. :Ö
® þV& †Ò JÚÊ~V :Ê" 800 ×¢ Šâæ:–
10% Ê Î Ù’² Vn6 Þ:.
3.4 Ÿ2# ›
CS 1034A/TMOS/MTMS ® 482Z n§2þ êš ª[² 
wÊ® SEM š Figure 4& î :.
MTMS ¾Ê 60%Ò ¢&ê 20 µmÊ6 100%Ò ¢&ê 32 µm
² MTMS ¾ óV– ªÞ ª[ ¦. óV®V:. MTMS ¾
 óV& †Ò CSÊ® MTMS z"Ân§ kV :&’²
ª[ ¦.V ¦" ْ² JÎ:.
3.5 Shqgxoxp#Kdugqhvv#
ÒnW’² pendulum hardnessê ª[® Ò wk®êÆ f
 FÊê 뒲 ª[® ²Ê& pendulumš «K2úÊr w
®B Ò î:.
Figure 5ê CS² HSA– 1034AÒ ÿ®B TMOS/MTMS® 24
2Z /ž n§2þ ê ª[® pendulum hardness® wkRÊ
Æ CS® Û®– TMOS/MTMS® †¿š& †Î pendulum hardness
wk†Ò ² ® ê Æ® ~ÊV ¢š «Î¶ n Þ:.
3.6 Plfurkdugqhvv#
Microharndessê ²Êš :ʚ2² ":  Vickers Inden-
terÒ Figure 6R oÊ Òk®â îš V®Êr(loading), indenterV
¾‚®ê ²V Ê(hmax)– Òk®â îš rÆ®Vš ¢ Ê â
K®ê ç(hcorr)š wk®B 3 (1)R (2)Ò ®B ® NŽ
plastic hardness(HUpl)– ® ‡kÒ ²Z®ê elastic portion

Polymer(Korea), Vol. 29, No. 3, 2005

246
k/šákþJážÛáÛÎráÊ2Rá²á–Zg

693#
0 ;3330 433#
HSA CS Plastic Hardness

Plastic hardness(N/mm2)
Elastic Portion
1034A C S
Pendulum hardness(s)

Elastic portion(%)
93330
653#
0

73330 :8#

5;3#
0
53330

573#
0 30 83#
# 93# ;3# 433# 453# 93# ;3# 433# 453#
MTMS Contents(%) MTMS Contents(%)

Figure 5. Pendulum hardness of CS HSA/1034A/TMOS/MTMS sol-gel Figure 7. Plastic hardness and elastic portion of CS HSA/TMOS/MTMS
coating films. sol-gel coating films.

;3330 433#
Plastic Hardness

Plastic hardness(N/mm2)
Elastic Portion
Fmax
93330

Elastic portion(%)
73330 :8#
Loading force

53330

30 83#
93# ;3# 433# 453#
MTMS Contents(%)
# kplq kfruu kpd{#
Indentation depth Figure 8. Plastic hardness and elastic portion of CS 1034A/TMOS/MTMS
sol-gel coating films.
Figure 6. Schematics of indentation.

433
0 43#
(ηIT )š ®ê ÙÊ:.7,8 HSA CS

Redness(a*), Yellowness(b*)
Lightness(L*) 1034A C S

;3
0 8#
Fmax
Lightness(L*)

HU pl = (1) R edness(a*)
26.43 × (hcorr ) 2
93
0 3#
Yellowness(b*)

Welast 73
0 08#
ηIT = (2)
Wplast + Welast
53
0 043#
93# ;3# 433# 453#
Microhardnessê pendulum hardnessJ: ª ŽV² Ò wk¶ n MTMS Contents(%)
ޒÆ, ® ‡WÎ ‡š 6z² ® Ò wk¶ n Þ:.
Figure 9. Lightness, Redness and Yellowness of CS 1034A/HSA/TMOS/
Figure 7R 8– CS² HSA– 1034AÒ ÿ®B TMOS/MTMS
MTMS sol-gel coating films.
® 242Z /ž n§2þ ê& V² plastic hardnesshR elastic por-
tion hš JBR6 Þ:.
CS² HSAš ÿ®ê , plastic hardness– elastic portion h ªÒ JV:. MTMSê soft segmentÒ Ê>† ¢Ž& MTMSV óV
š Figure 7& î êÆ MTMS ¾& †Ò plastic hardnessê ¾& †Ò elastic portionÊ óV®6 f² plastic hardnessV fâ²:
ò² ûš î  " ZnW’² ÓZ óV®ê hš î ê ٚ «Î¶ n Þ:.
 6 Þ:. Êê  ® ‡WÎ WCš î ê elastic portion 3.7 I# l`#
h f² ÓZ fâ®ê ûš JBR Ò®~š «Î¶ n Þ:. CS² HSA– 1034AÒ ÿ®B TMOS/MTMS® 242Z /
NBî MTMS® ¾Ê óV¶n³ hardnessV fâ® 6 :⠞ n§2þ êš MTMS® ¾& †Î ²Ê® lightness(L*)h,
ޞk² ٖ CS® n§V ޞk² Ù& †ÎÊ JÎ:. redness(a*)hR yellowness(b*)h® wkRÒ Figure 9& î :.
CS² 1034AÒ ÿ®ê , plastic hardness– elastic portion® h MTMS® ¾& †Î ® ~Êê îî ’Æ, CS® Û
š Figure 8& î :. MTMS® ¾Ê óV¾& †Ò plastic hard- ®& †Î ~Ê&rê 1034A CSV HSAJ: ª ÎÖ ±š š
nessV fâ®ê ûš JV’Æ, pendulum hardnessJ: :â Æ  ê ٚ ¢ n Þ:.

žVâ, \29Ì \3N, 2005T 

 ²²Ê2 :ʖ ¢«2 :Ö® ê-z ª[r ¿‡R ‡ 247

43
0
4. û«
HSA CS
1034A C S
8;
Color difference(E*)

CS– TMOS/MTMS :Ö:Z® ê-z n§ÆÊÊ ª[® ‡

69 & N®ê Wûš Æ®† Z®B CS Û®, CS Vš TMOS/MTMS
® ¾š, n§2Z Gš B®B êš ¿‡®6, ª2þ ª[
47
® ‡:š Ʋ Rê :¢R o:.
25 1) CS Vš MTMS® ¾ óV– ªÞ g_W– ZnW’²
óV®" CS® Û®, :Ö¾, n§2Z G& †Ò óV®ê þ
03
# 693#
0 8;3#
0 1433#
00 1453
20# ç– OÞ ~ÊV Þ:. HSA CS®  g_WÊ V ² 
MTMS Contents(%) ’Êr :Ö¾R n§2Z& †Ò g_W® ªV ÂÆ 2Ò¢
ê g_WÊ fâ®:V N Ê&rê óV®V:. 1034A CS
Figure 10. Color difference of CS 1034A/HSA/TMOS/MTMS sol-gel
coating films. ² rçr ® g_W– 80° Ê’² è’Êr :Ö¾R n
§2Z& Æ® Wûš q ®:.
2) ²Êƶ†ê HSA CSÎ & n§2ZR MTMS ¾&
730
HSA CS †Ò Rf®â Þ" 1034A CS&rê n§2ZR MTMS ¾
Surface free energy(mJ/m2)

6;
8
696
674
652
630
# 93#
MTMS Contents(%)
Figure 11. Surface free energy of CS 1034A/HSA/TMOS/MTMS sol-gel
coating films.
N R, HSA– 1034A þ¦ ‚Û®" ª[®† Z® slide
glass–® ~Ò wk®Vš ¢, Figure 10R oÊ HSAJ: 1034A
® CSV ~V Ââ îò:. Êê HSA® CS– 1034A®
CS® yellowness® ~& ®Êr r3²:ê ٚ ¢ n Þ:.
3.8 §¿Ûk5 #
HSA e 1034A CS:R TMOS/MTMSÒ ÿ®B 242Z /ž n
§2þ ê²Ö†   ª[® ²Êæv&^® RÒ Figure
11& î :.
CS Ûæ® ²Ê&^ê ´&r _² ÙîR ’J: : Æ
hš V6 ޒÆ, CS ²Ê&r ªN†Ò V :ÖÊ þRW’
² ª[nEÊ Ên§Ê Ò îÊ ²Ê&^ê Ââ š  1. D. Satas and A. Tracton, Coatings Technology Handbook, 2nd Ed.,
ÙÊ:. MTMS® ¾Ê óV¾& †Î ® ²Êæv&^ê
fâ®6 ÞêÆ, Êê ªN†Ò V6 Þê :ÖÊ CS® ²Êš
&"NEÊ n§®B CS® ²Ê&^hš ê
N²:.9
ª[r šÚ&r CS Ûæ²ÊÊ šÚ²Ê’² Îòn
³ ²Ê&^V š ÙÎÆ MTMS® þVÊ 80Ò , ¦
V CS&r ²Ê&^V Ââ ~ÊV î6 Þ:. ß, 1034A CS
Ò , MTMS ¾Ê 80ÊÊ šÚ²ÊÊ :ևڒ² ‡n
²Ê&^V šê nÊ, HSA CS ê N] ² ْ²
JÎ:. Êٖ æ® & ÛæV W
² ْ² êkn" ²ÊÊ~2® ~Ê& WûÊ Þš ْ²
JÎ:.
1034A CS
® ÆÊ& Wûš q 6 ²Ê6‡Ê n®V:. g_WR
²Êƶ†® û’² «Îޚ ¢, HSA CS/MTMS n§&rê
MTMS ¾R n§2ZÊ žk² ê ¿‡® gêÎæ² î:.
3) 1034A CS– TMOS/MTMS²Ö† rÆr ®2ª[– 550 ×
¢ê ÚÊÊ JW’² žk®V:. MTMS® ¾Ê – 60%
Î &ê ÚÊ~V 600 × ÊΠْ² «În:.
4) SEM’² wk² ª[ ¦.ê 1034A CS/TMOS/MTMS n§
&r MTMS ¾Ê óV¶n³ CS ÛæZ z"Ân§ k® ó
;3# 433# 453#
V² ¦"ê ûš î :.
5) Pendulum hardness– microhardnessÒ ² ® wkš Ê
1034A CSê MTMS® ¾ óV& †Ò V fâ®V’î
HSA CSê Æ û‡Ê :.
6) HSA– 1034A® ~ê Æ ~ÊÒ î  ê:.
7) ²Ê&^ê MTMS ¾ óV– ªÞ ZnW’² fâ®
ê ûš JV:.
ê-z ®2ª[r&r CS Û®, CS/:Ö® ¾š e W^² n§
2Z® v3– 6Ò² ª[š êÆ g꾚 ¢ n Þ:.
[÷£# KÜÊ ÒŽ– 2004š ¦"²Ã 21& ®®B &
n¢.
S+S
Chapman and Hall, 1990.
2. S. E. Yoon, H. G. Woo, and D. P. Kim, Polymer(Korea), 24, 389 (2000).
3. M. A. Fanovich, S. A. Pellice, P. G. Galliano, and R. J. J. Williams, J. Sol-
V:ê ٚ ® Gel Sci. Techn., 23, 45 (2002).
4. C. M. F. Soares, O. A. dos Santos, J. E. Olivo, H. F. de Castro, F. F. de
Moraes, and G. M. Zanin, J. Mol. Catal. B-Enzym., 29, 69 (2004).
šn 5. D. P. Kang, H. Y. Park, M. S. Ahn, I. H. Myung, T. H. Lee, and T. J. Lee,
KIEEME Annual Spring Conference 2004, 154 (2004).
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Solids, 330, 187 (2003).
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1 : Test Method (1997).
²ÊWÊ :Æ †Î 8. ISO 14577-1, Metalllic materials-instrumented indentation test for
hardness and materials parameters- Part 1: Test method (2002).
9. C. Perruchot, M. M. Chehimi, M. Delamar, S. F. Lascelles, and S. P.
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Polymer(Korea), Vol. 29, No. 3, 2005