Water Usage in the

Semiconductor Industry
Jeff Hanson, P.E.
Facilities Engineering Manager
Texas Instruments, Inc.
May 13th, 2009
 Texas Instruments
• Businesses
– Semiconductors
• Analog
• Digital Signal Processors
• Wireless
• DLP Technology
– Education Technology
 Texas Instruments
Semiconductors

Educational &
Productivity Solutions Sensor & Controls
$0.5B

Educational & Sensors &

Productivity Solutions Controls
Texas Instruments
Sustainability - The Triple Bottom Line

Environmental The balance of People,

Sustainability Profit, and the Planet
Ecosystem Integrity
Carrying Capacity
Biodiversity Environment
Social
Sustainability
Cultural Identity
Economic Empowerment
Sustainability Economy Society Accessibility
Growth Stability
Development Equity
Productivity
Human Well-Being

A sustainable system delivers services without exhausting resources. It uses

all resources efficiently both in an environmental and economic sense.
 Water Optimization Strategy
• Leverage industry associations for best practices
and consumption data
• Utilize semiconductor manufacturing equipment
data to drive improvements
• Leverage internal consumption data to
understand gaps and close
• Water Systems Team
– Facilities organization which works with fab(s) to
optimize consumption and reduce cost
 Industry Facts
• Semiconductor Industry Association (SIA)
– Industry trade association representing over 70 US companies
– Profile of the U.S. Semiconductor Industry
• U.S. 2008 Sales = $120 Billion
• Worldwide 2008 Sales = $249 Billion
• 2008 World Market Share = 48 percent of $249 Billion Market
• U.S. Jobs = 216,400
• Percent of Sales Outside U
U.S.
S Market = 77 Percent
• Capital Equipment = $13 Billion, 11 Percent of Sales
• R&D Investment = $20 Billion, 17 Percent of Sales
• SEMATECH
– Industry consortium that reduces the time from device research to
a manufactured product
• International subsidiary ISMI (International SEMATECH Manufacturing
Initiative)
 Wafer Processing Technology
130nm microprocessor
Interconnect
• 6 Dielectric
Deposition Steps
• 12 Dielectric
Etch Steps
• 6 Ta/Cu PVD Steps
• 6 Cu Plating Steps
• 6 Cu CMP Steps
• 1 W CMP Step
• 12 Wet Clean Steps
Ion Implantation

Copper Metal
Dielectric
Deposition
Copper
Dielectric
W-CMP
Deposition
Deposition
PVD + ECP
CMP
Etch
Deposition
PVD + WCVD
Poly Silicon
Transistor
GateSilicon
Poly Oxide
Shallow
Shallow
DepositionTrench
Trench
• 16 Growth
Thermal
Gate Etch Steps
Silicon Wafer Isolation
•Isolation
Shallow
11 Implant
CMP
Dielectric
Trench
Steps
Deposition
• 5 Isolation
Etch StepsEtch
• 2 CMP Steps
• 38 Wet Clean Steps
Semiconductor Factory Water Consumption

Source: 2006 ISMI Water Balance Survey

Semiconductor Factory Water Production

Source: 2006 ISMI Water Balance Survey

 Normalized Water Used
Gallons per cm2 Wafer Outs
10

9
8

6
3 91 gal/cm2 wafer outs
Industry Average = 3.91
5

0
1442

2544

9749

5738

9471

3927

6395

3858

5155

7324

8656

3996

3238

3148

2467

3532

3500

5636

1352

5474

3389

6593

2824

3017

8345

8736

8299

7337

3665

5061

5037

4879

4289
Source: Semiconductor Industry Association
 Normalized UPW Used
Gallons per cm2 Wafer Outs

6
Industry Average = 2.53 gal/cm2 wafer outs
5

0
9471

5738

3927

1442

3858

2544

3532

3148

5155

7324

6395

5636

1352

3500

2467

6593

2824

9749

7337

4879

3389

8656

3996

8736

3238

3017

8345

5061

4289

5474

5037

8299

3665
Source: Semiconductor Industry Association
 Equipment Vendor UPW Consumption
Data
• Common wet clean hood 600
500

Post SC1 Rinse

recipe data shown

Time (sec)
400
300
• Comparison of UPW rinse 200

time across many 100

0

companies A B C D E F G H I J TI L M

• Large variations present

for same process 600
500

Post SC2 Rinse

Time (sec)
400
300
200
100
0
A B C D E F G H I TI K
 Facilities Water Systems Team
• World wide team with members from all major
manufacturing sites
• Focus is on cost reduction and learning new water
technologies
• Forum for best practice sharing
• Develops strategy for recycle and reuse of “waste”
waste
streams
– 1st cut → Spent rinse water
– 2nd cut → “clean” acid waste water
– Others
• RO reject
• Water system instrumentation consumption
Typical Wet Process Tool Setup

PREFURNACE HOOD DRAIN

TYPE
UPW 1OO:1 UPW UPW UPW IPA
SC-1 Rinse Rinse
SC-2 Rinse Rinse DRYER
HF
SOLVENT
IWW
RECYCLE
RESIST STRIP HOOD
UPW UPW UPW UPW IPA
SC-1
SC 1 SC-1
SC 1 Rinse
Ri Rinse
Ri
SC-2
SC 2 Rinse
Ri Rinse
Ri DRYER
SOLVENT

IWW

SOLVENT HOOD
Organic Organic Organic UPW UPW SPIN
IPA IPA Rinse Rinse DRYER
Solvent Solvent Solvent

SOLVENT
IWW
 Spent Ultrapure Rinsewater
Poor Quality High Quality

City Spent
Two Main Water Sources: Water Rinse
Water

Two Main Water Users:

Cooling UPW
Towers Plant

Minimum Highest
Quality Quality
Requirement Requirement
Which source to send to which user?
 DI Recycle System Schematic

Re c yc le

Spent Rinsewater Recycle Benefits: Re c yc le

•Improved final UPW quality IW Re c yc le

• Less demand on the municipal water supply and IW

IW
waste water treatment systems R aw R .O.
Ult rap u re
Wa te r Wa te r
W at er
S t orag e P rim a ry S tora ge Ion E xc ha nge P olishing P oint
•Reduced chemical usage for ion exchange T a nk T re a tm e nt T a nk Tre a tm e n t
S to rage
Tre a tm e nt of Us e

regenerations and waste treatment

D.I. R et u rn
• Less risk of municipal water supply variations

IW

O t her
R ec la im
 Risk Analysis
$600,000

#1
Reward
$500,000

#2
$400,000

• City Water Offset #6

• Chemical Savings $300,000 #3
• Increased savings #4 #7
by recycling to low
$200,000
end users #8
• Improve water #5

quality $100,000

$-
0.00 1.00 2.00 3.00 4.00 5.00 6.00 7.00 8.00 9.00

Risk
• Bio-fouling • FAB impact
• Dumping Chemical • Equipment Malfunction
other than organics • Project not succeeding
•Project not succeeding
 Review of Water Demand – 1st Pass
City Water Demand Internal Re-use

A = 850 DIW B Brine Recovery = 270

B = 1705 Plant A DI R = 250

C = 315
Cooling
g
D = 150 Towers A Brine = 200

A = 50
A DI R = 150
A = 300 TPU and D DI R = 125
Scrubbers E IWW Re-use = 150
D = 125
% Water Re-used = 29% F IWW Re-use = 280

Total City Demand = 3495 Total H2O Demand = 4920 Total Internal Re-use = 1425
*All values in gpm
 Review of Water Demand– 2nd Pass
City Water Demand Internal Re-use

B Brine Recovery = 270

A = 850 DIW
Plant A DI Recycle = 250
B = 1705

C = 25 A Brine = 130
Cooling D DI R = 115
D = 35 Towers E DIR = 175
A = 50 KFAB DIR = 185
A DI Reclaim =150
TPU and D IWW Re-use = 250
Scrubbers E IWW Re-use = 150
% Water Re-used = 46% F IWW Re-use = 280
A IWW Re-use = 300
Total City Demand = 2665 Total H2O Demand = 4920 Total Internal Re-use = 2255
*All values in gpm
 RO Brine Recovery
“Winner 2001
AWWA Bob
Derrington
Award”

Water Recovered 216 GPM

Yearly Water Savings $295,000
Installation Cost $142,000
Yearly Operating Cost $33,500
 Conclusion
• The semiconductor industry is actively searching
for more ways to optimize water consumption
• Benchmarking with industry and internal data will
continue to drive industry water consumption
down
• The “low hanging fruit” has been picked; new
ideas are needed for existing water reuse barriers
(reduce risk)