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Marks: 20
Statement. As a process engineer, you are given a task to dope an intrinsic silicon film with phosphorous atoms at
room temperature until its resistivity reduces from ~10 5 Ω.cm to only few ~Ω.cm.
(a) Show using a plot that how the concentration of holes and electrons in the silicon varies as a function of the
concentration of the donar atoms.
(b) Show using plot that how the resistivity of the silicon varies as a function of the concentration of the donar
atoms.
(c) Show using plot that how the drift current density of the silicon varies as a function of the concentration of the
donar atoms.
(d) Conclusion.
Parameters. Assume that, for the silicon, the electron and hole’ mobility remain constant at μn=1350 cm2/V·s and
μp =480cm2/V·s, respectively. Choose parameters that best suits your assignment.
Authors Contributions. Mention each authors contributions at the end (it is mandatory to discuss this).
Author 1.
Author 2.
Presentation.
Grading scheme:
1
Parameters: 2 marks
Plot 1: 2 marks
Plot 2: 4 marks
Plot 3: 4
Conclusions: 4
Presentation: 4
Total : 20 marks
Copying. Copying is highly discouraged and it will lead to a significant loss (90-95 %) of marks.
* Copying includes using sentences, parameters, formats from others. Discussion is appreciated, but attempt at
your own to make it look original.
Submission.
1. Submit through LMS in pdf format
2. File name must include the authors name as below