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Optical Communications
Chapter 4: Optical Sources, part! (LASER 1)
eee

Dr. Saughar Jarchi


Imam Khomeini International University (IKI)

saugharjarchi@gmail.com

Introduction

= The optical source is considered to be the active component


™ Its function is to convert electrical energy (in the form of a current) to
optical energy.
: = The | process should be efficient,
“A The output light should be effectively eousled to the into the optical fiber.
= Two main sources for optical fibers:
= Light-emitting diodes (LED)
LASER) /

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Major requirements of an optical fiber source:

m™ Size& eqnpayration Compatible fo launch power into an opticalfiber


: -
UJ
-» Accurately’ ‘track the ele trical i input si dat must be linear ares
/ t
Wa et bie Aah)» 7O 52! ¢ {VANE 1/64 Mo 3 iba ee aU BD PoaJ)sb-s wt Uy yp Pte
0 Emit fight at eyelet where the.fiber has lolow losses and low eu
AM)! el A) 9% prSJl p aap
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= Capable of Sample signal modulation over a wvide
nal fl J is

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=eg sufficient optical power to overcome attenuation. - ie Ze
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» Have a very narrow spectral bandwidth (linewidth) to imize ‘ dispersi on Niet
JB) x |p lar ty t jose Pe
J Vf £
= Maintaining a stable optical output which is unaffected by’ changes i in ambient
conditions
™ It should be cheap and highly reliable

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Comparison of sources:

LED and injection laser diode (ILD) are semiconductor sources


= LEDs have been mainly used for multimode fibers
™ ILDs are used for single mode fibers
m™ LEDs have advantages of simple construction and low cost
= ILD are used for long distances
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Ea Basic concept:
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®™ LASER light amplification by stimulated emission of radiation


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™ LASER isa device which amplifies light NE. Z
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™ Practical realization ofa LASER is an optical osciffator ‘dl Oy be Pow ppl tip on Ae By 97)
= Formation of an ne sande wave within a cavity (or optical resonator)
- i So yA . i Pp ‘es
* LASER provides an output of monochromatic, highly coherent radiation
® LED provides optical emission without an inherent gain mechanism

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rption & emission of radiation:


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= Interaction of light with matter takes place in discrete packets of energy or quanta,
called photons erg es . ;
“= Atoms exists only in certain discrete energy states
© Absorption and emission of light, causes the atoms to make a transition from one
discrete energy state to another.
= The frequency of the absorbed or emitted radiation is related to the difference
between the higher energy £2 and the lower energy state £,

E=68,-—6&, =hf
= Absorption & emission of radiation:

; = These discrete energy states for the atom: may be considered to correspond to
electrons occurring in particular energy levels relative to the nucleus. ~
® Single electron transition between two energy levels within the atom will provide
s a change in energy suitable for the absorption or emission ofa photon.
® Modern quantum theory gives a probabilistic description which specifies the
energy levels in which electrons are most likely to be found.
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Absorption & emission of radiation:


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= Three processes:
( = Absorption —Y
eaten emission 59x jpvl (LED »» pthavl >
™ Stimulated emission f
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Initial state Final state


i ————_a—_—___
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Lr" Absorption

£, ——__e———

> An atom is initially in the lower energy state E,


> A photon with energy (£2 — £,) is incident on the atom
> The atom may be excited into the higher energy state E> through
absorption of the photon
> The process is called absorption (stimulated absorption)

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Spontaneous
emission i —

“* Spontaneous emission. the atom returns to the lower


energy state in an entirely random manner
7 4” The random nature gives incoherent emission E=£,-£, = hf. }
zi % The basic mechanism for light generation in LEDs. J ;
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Stimulated emission: when a photon having an energy


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equal to (Z — £;) interacts with the atom in the upper


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energy state causing it to return to the lower energy state


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with the creation of a second photon


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Stimulated emission:
> is of an identical energy (frequency) to the one which caused it
The produced photon
> in phase and has the same polarization of the incident photon
The produced light is
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Coherent radiation is
> The liberated energy can add to the wave in a co nstructive manner, providing
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™ Under thermal equilibrium, lower energy level E, contains more atoms than

——
the upper energy level £,
® To achieve optical amplification, population of the upper energy level
must be
greater than that of the lower energy level
“= This condition is known as population inversion, '
INS, Weel Sap! oe
® To exsiatoms into the upper energy level an external energy source in used
» The process is referred to as ‘pumping’
1

= With suitable pumping the electrons in some of the atoms may be excited
from
the ground state into the higher level E,
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Ey Pumping
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(a) (b)

Figure 6.3 Energy-level diagrams showing population inversion and lasing for two
nonsemiconductor lasers: (a) three-level system — ruby (crystal) laser; (b) four-level
system — He—Ne (gas) laser

Optical feedback and laser oscillation


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™ It is necessary to contain photons within the laser medium.


™ Placing mirrors (plane or curved) at either end of the amplifying
medium
= An optical cavity is formed.
™ Laser is analogous to an oscillator:
(@ Amplifier —» *imuletecl ere''ss ion
m4 > Positive feedback —> mirvers ia Coury 5 cee &
STEPPES

(= Frequency selecting mechanism —> /seytio °° County


® Positive feedback is provided through reflection
at the mirrors.
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® Laser is analogous to an oscillator:
™ Amplifier
= Positive feedback
™ Frequency selecting mechanism
= Positive feedback is provided through reflection at the mirrors.
™ Amplifier is the laser medium.
= The optical signal is fed back many times while receiving
amplifications it passes through the medium.

= The structure is a Fabry-Perot resonator.


* The amplification of the signal from a single path through the
medium is small.
s After multiple passes, the net gain can be large.
™ If one mirror is partially transmitting, useful radiation may escape
from the cavity. Mee pyr Sia ae

Fabry-Perot is named after Charles Fabry and Alfred Perot,


two scientists, who developed the instrument in 1899.
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( > Frequency selecting mechanism

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mA stable output is obtained, when the optical gain is

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matched by the losses in the amplifying medium.
= Losses result from:
. , ( @ Absorption and scattering in the amplifying medium
P: rT ) . . . 1

Wi e, = Absorption, scattering and diffraction at the mirrors


® Non useful transmission from the mirrors
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® Oscillations occur in the laser cavity over a small range of frequencies

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_ Where t € cavity
gayitygain is sufficient
gain is suffici
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to overeome the losses tee!
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ad> T hus, “the. device is not a perfectly monochromatic source but emits over a
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= The central frequency of this spectral band is determined by the mean
energy level difference of the stimulated emission transition.
= The amplification within the laser medium results in a broadened laser
transition or gain curve over a finite spectral width.

Relative A 0
amplification

Gain curve
or envelope
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r > Steady-state conditions for laser oscillation are achieved when the
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© A minimum or threshold gain within the amplifying medium must


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be attained such that laser oscillations are initiated and sustained.


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s= We assume the amplifying medium occupies a length L completely


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filling the region between the two mirrors.


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= On each round trip the beam passes through the medium twice.
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E(z,t) = 1(z)e/@'#4-)
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| | 1(z): optical field intensity


| w:angular frequency
|B: propagation constant
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EG,t)= I(z)e/(ot-B2)

ig= 1(0)e tg (hv)-athv)]z


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intensity at z = 0

intensity at Z
E(z,t) = I(z)ei(t-62)
I(z) = (Oe! g(tw)~a(nv)]z

a: ef fective absorption coef ficient of the laser medium


lr: optical confinement factor
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» There are discrete emission frequencies of oscillation in the laser cavity.
>» The frequencies of oscillation are determined by the various integer
values of m, and each constitutes a resonance or mode.
® Since the frequencies are obtained for the case when L is along the
longitudinal axis of the structure, these frequencies are known as the
longitudinal or axial modes.

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= A large number of modes may be generated within the cavity
laser.
= However, the spectral output from the device is defined by the a
Te
He Dy

gain curve.
EPieee reece
™ The laser emission with only include the longitudinal modes
contained within the spectral width of the gain curve.
=™ Such device ts said to be multimode.
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(b) Frequency

The longitudinal modes in the laser output.


Rete
kG?ec SF | F SS 3 =F
(RRR
a a% x x
™ Laser oscillation may also occur in a direction which is transverse
to the axis of the cavity.
® This gives rise to resonant modes which are transverse to the

a
direction of propagation.

a
™ These transverse electromagnetic modes are designated ina

FEDB Reeneraeqgnee a
similar manner to transverse modes in waveguides.

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Optical emission from semiconductors
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Optical Communications
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Chapter 4: Optical Sources, part2 (LASER 2)


DS
TL

Dr. Saughar Jarchi


Imam Khomeini International University (TKTU)
TT

saugharjarchi@gmail.com

Optical emission from semiconductors


- : af ;
Oo» Lnager (Pls f

Res The p-n junction:


G attte t

™ A perfect semiconductor crystal containing no udu or lattice defects is said ee


to be intrinsic ly NO Agw sly Np aah eae pe tee OT
™ The energy band structure of an intrinsic santicondictor |is rerned by the valance
and conduction bands separated by a forbidden energy gap or band-gap E,
= The width of the band-gap varies for different materials.

Fhe, slow pet Duan 2 tL ae tos fi: Pe,


j /

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by het pe .
. i vi 12 ,, f jf se, Fes ; z ;
t ao <
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fall
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@ Electrons © Holes aa {a
: 1A a3 LB) ee AIG b leala) ol5, > lenge 0 2 1 P(E)

y Ay peal | Ee, he The energy band structure of an intrinsic semiconductor above absolute zero
try de ~
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SF M ie is = My we) :
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® Ata temperature above absolute zero. thermal excitation raises some electrons from the
valance into the conduction band, leaving empty hole states in the valance band.
= Theses electrons and holes are called carners, and allow conduction through the material
= The probability P(£) that an electron gains sufficient thermal energy at an absolute
temperature T, such that it will be found occupying a particular energy level F, is given by
the Fermi-Dirae distribution:
Cure! ew wg 4
¢ af !

J! p(B)= 1
1+ exp[(E — E-)/KT]

K: Boltzmann's constant

E,;: Fermi energy (Fermi level)


TT

® Fermi level gives an indication of the distribution of carriers within


the material.
» For the intrinsic semiconductor, Fermi level is at the center of the
w

band gap.
QW

® For the intrinsic semiconductor, there is a small probability of


electrons occupying energy levels at the bottom of the conduction
VOY

band and a corresponding number of holes occupying energy levels


at the top of the valance band.
9xSYVN
Sy¥y
ess
S
x
Fermi-Dirac probability
Conduction band
distribution.

E, E,/2 E,
yer We Vo =———
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y — oe oe ees ee ee oe ee

° ° 0° 0 oo
° °
| Valence band

® Electrons © Holes
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«=
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mo
RAARAEEMARABRAMA
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= To create an extrinsic semiconductor, the material is doped with
ie, Impurity atoms:
® To create more free electrons: donor impurity'
© To create more holes acceptor impurity
™ Donor impurities form energy levels just below the conduction
band.
™ Acceptor impurities form energy levels just above the valance band

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jl Figure 6.9 Eneray band diagrams: (a) n-type semiconductor; (b) p-type semiconductor
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| 2 ® When donor impurity is added = 7 wh het?


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band to
=F za create an excess of negative charges and the semiconductor is said to be n-type
| __ [ . .
at = The Fermi level is raised to a position above the center of . the band-gap
1
j o = When acceptor impurities are added
> ® Thermally excited electrons are raised from the valance band to the acceptor impunty
= BA levels leaving an excess of positive charge carners in the valance band and creating a
po p-type semiconductor
=

ae ® The Fermi level is lowered below the center ct the band-gap =


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:
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a ¥

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BA potential barrier is established between the p- and n-type regions which restricts a
the inter diffusion of majority carriers from their respective regions
.
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® Both the depletion region width and the resulting potential barrier are reduced.

® Electrons from the n-type region and holes from the p-type region can flow more readily across the
Junction into the opposite type region
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= These minonty carriers are effectively mjected across the junction by the application of the external
\

voltage and form a current flow through the device as they continuously diffuse away from the interface
= This situation in suitable semiconductor materials allows carrier recombination with the emission of
light
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region in the forward biased p-n diode leads to the recombination of
carriers across the band-gap.
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material and the normally empty hole states in the valence band of the n-
type material are populated by the injected carriers which recombine
across the band gap.
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| 2 is dependent upon the semiconductor materials used and the fabrication of the
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aT Rt @

@ Direct band-gap semiconductor


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crystal momentum
@ The energy maximum of the valance band occurs at the same (or very nearly the same)
value of electron crystal momentum as the energy minimum of the conduction band
7
|

= When electron-hole recombination occurs the momentum of the electron remains


virtually constant,
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® An efficient mechanism of photon emission occurs


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= The average time that the minority carrier remains in a free state before recombination
(the minority carrier life time) is short (1078 to 10-29 s)
1p
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® Indirect band-gap semiconductors:
© The maximum and minimum energies occur at different values of crystal
momentum,
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losses momentum such that it has a value of momentum corresponding to the
maximum energy of the valance band.
® The conservation of momentum requires the emission or absorption of a third
particle, a phonon,

® Recombination in indirect band-gap semiconductors is relatively


low (10-2 to 10~* s).
® Longer minority carrier life time, compared to direct band-gap
semiconductor.
® Greater probability of non-radiative transition, compared to direct
band-gap materials.
® Indirect band-gap emitters such as silicon and germanium give
— : . a
insignificant levels of electroluminescence.
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r

Semiconductor material (eV) (cr? s~')


}
\

Direct: 1.43 Deus 1022


eae ¢CaSb Direct: 0.73 2.39 x 10°?
,

-“~" \ InAs Direct; 0.35 8.5« 107)


Direct; 0.18 4.58x 10"
=| = =|:

( Indirect: 1.12 1.79 x 10°


\ Indirect: 0.67 5.25 x 10-4
Indirect: 2.26 5.37 x 10°"
k
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Some direct and indirect band-gap semiconductors.


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Other radiative recombination processes


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= In the preceding section, only full band-gap transitions have been
considered.
gap by impurities or
= Energy levels may be introduced into the band-

pm me
lattice defects within the material structure.
defect centers may
= Recombination process through such impurity or
be either radiative or non radiative.
® major radiative recombination processes: band to impurity center,
impurity center to band, donor level to acceptor level.

ap
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op

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mr
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b) Conduction band to acceptor impurity, and donor impurity to valance band transition
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level

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Stimulated emission and lasing



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® Carrier population inversion is achieved in an intrinsic (undoped) : ‘


semiconductor by the injection of electrons into the conduction band 4g
of the material. ee
™ At absolute zero, conduction band contains no electrons. ; ~-
eoek
™ When electrons are injected into the material, they fill the lower g [ t
energy states in the conduction band up to the injection energy or 6 | t
the quasi-Fermi level for electrons. on :
™ Incident photons with energy Eg, but less than Eg = Erc — Ery, can ——
not be absorbed. —E
o c
® These photons can induce a downward transition of an electron from a Ls
the filled conduction band states into the empty valance band states, 4 Ls
, thus stimulating the emission of another photon
By Ei vob
o a4
Ai 59 la, Je | a
ae ( i. é d
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ring rel aout,


Cee Sais Ou; i é Loy? eataf
Ll fp ah o hp

A ==) electron : < =


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band ® ig
= ¢ ‘

o=—
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E, a en
> ST é
|= =r,
ates
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Valence g
band SH Kl e— {

; Por (> tad (b) faa - - a tnt SS or lit «


=
\ Figure 6.15 The filled electron states for an intrinsic direct bandgap semiconductor at ¢t-
absolute zero CRef. 6]: (a) In equilibrium; (b) with high carrier injection Vv e [§
7 z eas Pt fice so} , a ee Jit antes li Le + ns
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BOTT SKCKVOHHOHUHEHMEHE

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REESE Resse S seine

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erle yy) ® yle £,

Valence
band

\The basic condition for stimulated emission: Epc — Epy > hv > Eg 7
ot iD py ls o /
: DY) BIN Ne I) gi nee Sc bal 2 j
Ceesfits ’
eo
= a i) tl, 4 Abas ait
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pf 9) vl yoy y, Pig aye pl (4) | he : ee
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’ = = j al ee a , uy p x* AS & — — Ae

pater be ; - J F / ‘
cy C/o" 9? 4 fF 4 “cyt ag 2 1 4 ) iF } sama
or fA »ac : Z|) + i On) CP 4 440) ge5 Sf 7 .
\ : : . / ;
UAL 0G AI
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ae

® Population inversion may be obtained at a p-n junction


by heavy doping of both the p- and n-type material.

= A forward bias can also be applied.


Se

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™ There exists an active region near the depletion layer that contains

AP
simultaneously degenerate populations of electrons and holes.
MH

ei
@ For this region the condition for stimulated emission is satisfied a

| ae
St

® Thus any radiation of frequency v which is confined to the active


‘le be be
St

region will be amplified.


bans | ae)
St

= A further requirement is the provision of optical feedback.


4p

= It may be achieved by the formation of mirrors at the ned faces of


ar \\ae. \ae ‘an ‘ba
ss | a
gp

the junction diode, to make a Fabry-Perot cavity.


ap

1
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ap

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™® Homojunction:

Y
Single p-n junction fabricated from a single crystal

&
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ne Lhe ep lina Oy pO U2 ows) be

ay
ty ay
@ Heterojunction: 34 Ae
™An interface between two adjoining single crystal

gs
semiconductors with different band-gap energies,.~ (4 (->4e wu
= . t .—

ereeggT
® Hetrostructure: —sluosyn ~
® Devices which are fabricated on heterojunctions.
Dguco linn! jeu (5 2 2, / LED GP |Z (S! &
- = - rf : , -

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® Radiative properties of a junction diode may be improved by the use
of heterojunctions.

® Heterojunctions are classified into:

@ |sotype (n-n or p-p)

® Anisotype (p-n) n>? Pe oy |

= A ooo pane
; ; : a — | oe
Dwyer? 4 rl MM iyi) 9 4201b-Jo 0,5 Re) ‘ul She
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™ Carrier confinement:
}
OUCH

@The isotype heterojunction prov


ides a potential barrier within
structure which is useful for the con the
finement of minority carriers to a
small acti ve region.
™ It is achieved by band-gap difference
of the adjoining materials.
@ The technique is used for the fabricat
ion of injection lasers and high-
radiance LEDs.
= Anisotype heterojunctions with
sufficiently large band gap differences
Improve the injection efficiency of
either electrons or holes.
H ,
\

™ Radiation confinement to the active region:


OOH

* Both type of heterojunction provide a dielectric


step due to the different
BIVBVB®@@WwoseVVIFSHH

refractive indices at either side of the junction,


® Carrier confinement:
i\

™The isotype heterojunction provides a potential


barrier within the
structure which ts useful for the confinement of minority carrie
rs to a
NS) SE Sl)

small active region.


®t is achieved by band-gap difference of the adjoining materials.
\\
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AMONG ase (re pila) stick 88 2290 DWP AA Ce Calica corey? ee sin Aitegs eT
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AINA
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The double heterojunction injection laser: Gleam


a) The layer structure
b) Energy band diagram a =

PHRPRPHMMRNDDHNDNNDBFEHHRKCKCKCHBHMPKHAVATH
c) Refractive index diagram ‘ peeeee yt uennienan
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se = se i ; = t Optical output

Fa
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The double heterojunction injection laser:
faa en fe

a) The layer structure ited aa


biz.

b) Energy band diagram SS ee ee ee


c) Refractive index diagram
Refractive 4 —
Index wr’ “Ss,] Electric feta
RECEEC CCS

«, Gistributlon
te)

Distance
pp o
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Pe FZ pepe by?

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The double heterojunction injection laser: A Cleve ar A


a) The layer structure
b) Energy band diagram
c) Refractive index diagram * (ection electrons
Ey = E—

tb}

ly, this if
, you V wba iw Jy
@ 3 CF ye ero : ; ) f Optical output

9
oon
9
(a)
@
angQanangnnang

; a = Electrode
The double heterojunction injection laser:
a) The layer structure
b) Energy band diagram
1
|

c) Refractive index diagram


Pre

esha wes | Electric fleld


rc ne Sistrlbutlon te)

Distance
PPP
PO
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The semiconductor materials used for optical sources must have the
following characteristics:
™ Appropriate p-n junction: have suitable characteristics for carrier
wy

injection.
® Efficient electroluminescence: have a high probability of radiative
HH

transitions.
® Useful emission wavelength: emit light at a suitable wavelength to
SIS

be utilized with current optical fibers and detectors (0.8 to 1.7m).


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Table 6.2 Some common material systems


used in the fabrication of
electroluminescent sources for optical fiber communications eT
& | Soe
Material systems

& = |

active layer/contining layers Useful wavelength <y


range (jum) € 5
Substrate eat
GaASIALGay,AS* UU! ; i
ie oxi, 018-0.9
GaAs/in,Ga,_,P 0.9 GaAs “Te
Al,Ga,_,AS/Al,Ga,_,As
0.65-0.9 Gafs as | al
InjGa,_,As/in,Ga,_,P GaAs exact
GaAs, ,Sb,/Ga,_Al,As, ,Sb, 0.85-1.1 GaAs
0.9-1.1 oat
Ga,_,Al,As,_,Sb,/GaSb GaAs ~
In,_,Ga,As,P,.,/InP 1.0-1.7 GaSb
0.92-1.7 + ns
In,Ga,_,As/InGaAlAs InP i
In;_¥GaN,As,_,/GaNAs 1.3 InGaAs
1.3-1.55 é it :
In,_,Ga,N,,As,Sb/Ga, ,Al, As
1.31
GaAs Gam
GaAs é : 4
{ ! ¢
:
C } |p & [ ‘

beewed gay?
ey lu ejay poe So
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qa
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& tin

i
>
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The semiconductor injection laser


ga

Tar 4
DPyPMoMmKrOrnrnAarnDDaA

WW MW 7
|
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cl BeSeCr cu cr \
Dae
Baer. ine
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ry >
“it-s
|
— ys
a

- =>
—S

—)s
a of the injected
Stimulated emission by the recombination
9
=)? carriers is encouraged in the semiconductor injection laser or
-—@
e. 3 injection laser diode (ILD) or injection laser.
a a |

oe; * ® An optical cavity must be formed to provide positive feedback.


fie er rm]

® ||_Ds have advantages over LEDs.


9
=?
eo
oe 2

=?

he | »

. is
a _ >
= 2 hitg

e-

=13
Advantages of ILDs: ie
12
> High radiance due to amplifying effect of stimulated emission. They
ie g
“will{| generally supply milli-watts of optical output power.
oye ® Narrow line-width on the Ordes of 1 nm, which minimizes effects of
oh bs Hs
il 2 material dispersion foul |
oi 2 ® Relative temporal coherence, which results in narrow liné-width:
;a 4
Le2 = Good spatial coherence which allows the output to be focused by a
in directiona
lens into a spol (and results crt l radiation pattern). Apis Core CCE
if i abe 9 Cy
o4,J EE.01.5 Lice onIT se ha Gia “
Me ey Asli
& ‘| ot 1p)? 2” 2°” Radiance: the emitted optical power per unit solid
ent angle per unit projected area ofradiating surface.
a cv Ao pid Cy
y dad / oot
eee © Eye he t x}
2D See ott =
iat
Ge dad as
rami
ony >
er»
®
$4
is
S53
& §FER i
fee
Cleaved crystal + Fabry—Pérot cavity

THRHKHMRAVTLEGS
p-GaAs Pe

hf —<~~~ p= —------ Le ee a bf

| =< Active region


pn junction Ohmic contact Sines

AHEM Y
Schematic diagram of a GaAs homojunction laser with a Baby ete! cavity

PEP
fs ¢ je ! pe n3h pH § Lye pas? 10
(ps lore He zy? ba 22 9 — Ga

ceuee
ple JEcom or!pth, lu gle
:
J 2) iu! , Cols YO) Oa M

TK
&y %
PMPMnrargoanagay
Efficiency _ Gp
gp
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mm
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t
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a
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sclioe There are a number of ways in which the operational efficiency of the
|

on semiconductor laser may be defined.


2 = Se) by spe, Differential externalI quantum efficiency (slope quantum efficiency):
wit » ‘the ratio of the increase in photon output rate for a given increase in the
a » number of injected electrons.
~ % For a CW semiconductor laser is around 40% to 60%.
: _ = Np: differential external quantum ef ficiency
=e, P.; optical power emitted from the device
a I; the current
I 2 e: the charge of an electron
a ~~] = hv: the photon energy

=?
3
ae
=?
2-2
_
: ia
ie ies)
j
i

j=
e= @ : : = UEP optical power rate dp
e-—- @ _ the number of emitted photons rate _ energy of one photon fy _ @ 4P
6 @ ips injected electrons current ~ dl hvdl
— 2 Uno sents lads electron charge e
“ai O50 Beocel 5 w hap
=e ine

-3 s
a tt. bandgap energy: E, = hv

= - -
<a doy (hk - e dP
De
eS
233, |
4,
Np
= E.——dl
e& — 2 - g '

ea ®
5 .

is
e TL» -

2
dP /dI is determined from the slope of the output characteristic in the lasing region.

( IG fy Lady Q) 302, MPI 9 :

Light A

output
(power)
Idealized optical output power
against current characteristics
(also called light output against
current characteristic) for a
Stimulated semiconductor laser
emission
Spontaneous region
emission
region

/ >
He Current
Threshold current

(0)
all

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aii eines
ehh a}

>
ee
—— . YL. Ys be) On47) Golis Ow aos) We)

. r number of photons produced in the laer cavity


os~~ internal quantum ef ficiency: n, =
re : Hf vals number of injected electrons
df Cay y (ea gd Jake
te eo

i | ‘
a. Internal quantum efficiency is around 50% to 100%.

~~ De ia iE
Se 2% 892!¥ 6 NW =M 1
i 2 i= (2au/m (en)
ire , Z f a L . Wy , Dae hae gb CY” tJ
; Od, by?
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>
reas ta tae

3
=)
3

ZED
Seals alee Slee Fae

=)
1
oe

No = iy Coy ae a
1+ (2a0/tn ( 7)
Boe
PVVPVVIVITIVVVV OI

a: ef fective absorption coef ficient of the laser medium

L: length of the laser cavity


Jt g4 Cy wll
R,,Rz: the mirror reif lectivities
ae ee eo
5 : s
Bases My UNGe? etF qrency - rect tonal (570” G2 OI aA>29 ge)
AD) 5° v enna
es :

LA
Spy
=> W9 wb Hae:
acdire layer 08ers Vg)
zie Aol 5 J
ene ia
Coulee cay 7 oP5 E

, - f # ra . Fe ny
eileihe fFsey wy 9 Mag ES
{- : 5 yf 5 524 Tf
POO GP O77 6» UlLo,3¢ é Arete nw) ¢ PLE;A

Sy

1
os

4
total ef ficiency (external quantum ef ficiency): Nr

Gis Sy yg NG P,

total number of output photons hv


Nr ~ total number of injected electrons Ta

II
OSS we aj pis be je e
i“

iT
f
anagregeeere
yD L?

Ey kay Contact metallization Light output

Confinement
layers

p-GaAs
ay?

(active layer)
Pig ,
OCS
flats
ue nA
of
aaa

Light output Roughened


7 Bf sides
cath

Cleaved mirrors
—_om

A broad-area GaAs/AlGaAs double heterojunction (DH) injection laser.


_

2} ! Me Jodie 9, re) if a>

SP
im. * Ww
whee? Onn pt , ay Ales!

te

|
whagab, PP nag (gh F
eeeece
(MVS Bad oS oC Nyy Wg glo We Wasa)
Paperpy /

. ie bpp Crt i
| =

sila pal / j

C - ee aby )
Contact
Stripe metallization
cS
@ e@

contact
Silicon dioxide
j
\

(insulation layer)
st

yj
ES Sete
HOHLHHHEEE

Confinement layers

p-A|,Ga,._ As
(active layer)
ee Emitting lone
Leer region U
ly gop OS ee
pure” Schematic of an oxide stripe AlGaAs DH injection laser.
eo 7

DEVORE
ENE Ve

ater Ais Py
_
1

rd

2 GaAlAs/GaAs {
ae
le
GaAlAs
InGaAs (MQW) { Top contact
Top DBR mirror
GaAlAs
ees AlAs/GaA:
5
lon implantation
Active cavity

7 ie GaAs {
. 2 Bottom DBR mirror

“T=
G—- °
Substrate
Os Bottom contact
o——
ee >
Structure of a vertical cavity surface-emitting laser.
i= |
G ys AM Aids ABE Sr
Ga °
-.
ls
2 tow Nes ial ww biglOrypsiles
app) ) LMC? A? OE
MG = /. lt 2 } / eelee ) eV ¥
ATs? ; C) Hb . df
' : ain i } a | ri

~ UI? te 50 »| ail
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Threshold current temperature dependence

/ <

Light 4
output
(power)

Stimulated
Spont emission
pontaneous testo
emission w
Rigi ee A Onal

. Current
Prbol por),SPESION, », v0.5 aThreshold
16a current
.
tre a Ko,
Asda) :HO) [yg a oe let dpe wl Ld
4 ngh Fee LD) 29 519 ag 0 Be
2 le aw)

ee Seige JLy ela e/


F q Y
TT
ae
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i
a
be he
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If os Lin, ) { Cpt J

ae OPE ey O50, hese) sere T,


re 7 a
<

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Jen % e170
F/T,

rs @ In general term , threshold current tends to increase with temperature.


y= ™ T is the device absolute temperature
¥ ut ° ® 7p is the threshold temperature coefficient which depends on the material
i] = ™ For AlGaAs devices, Tp is in the range 120 to 190K
mii > @ For InGaAsP devices, 7p is in the range 40 to 75K
Mle = Thus, temperature dependence of InGaAsP devices is ‘Stronger, 301.) » in‘ iAP
i Mig = Thermal dissipation should be considered and adequate heat sinking 1sessential,
— 2 fs
e-—: >
=?
ee ~ >

o> >
a>
ee

40 40
30 | 50 30 50
20 60°C 20 60°C
= = 10
= \ \
= 2 7mW 7mW ¥
a 2 WA =0.5 NA=0.5
i
ae

a= Light Light
<= 2 output output
2
Se
oi?
<1 - 0 100 200 0 100 200 300
— 9 Current (mA) Current (mA)
=< AlGaAs InGaAsP
e
<=»
iE > IPD
} ¢ famed
c sb, ¢ f Cs ( as 4 oP I'D
+ tube
Zs

Tp. -
B >
Se
5 VIEL, pela e
: } 1) i. / 0 ( |
wAdcrery oly, wb PA 970 J, Iy

10
A= 1,55 um “4 Lp

: Ea

Light power
per facet (mW) =
_

| KE0 50 100 150


i 200
Current (mA)
Ligth output against current characteristics at various temperatures for an
InGaAsP double-channel planar BH laser emitting at WANelEHEtE of 1.55um
Gueaawne
WP

Optical Comm
un i cate ms

Chapter+ Optical Sources, part3 (LED)


ieee

Jarchi
rer rere

Dr. =
eer Soham Gres Seve (RCT

sausharprohi2smaivm
ears

Introdu ction
&
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me
&
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wy
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rtd, or
5 a pan ecuwht
(57907 SR L
se x
™ Spontaneous emission of radiation from a forward-biased p-n
Junction was discussed. 7
a
™ The normally empty conduction band of the semiconductor is =
populated by electrons injected into it by the forward current Fal
through the junction. Smt
= Light is generated when these electrons recombine with the holes in & 5

--
e© ‘
valance band.
™ This the the mechanism by which light emitted from an LED.
_
ad Stimulated emission is not Ses ihas.
As
aed
) pipe ey ats BO ee naw aFe ~
Ua) ts Pee Jy /

y
b=

\
ls : ee . P po ie ICS & — : AA By
ew

EK LS ws
OS Uy sels .,AM ty 6 c f a I; ' q'ededD
Cr yb» LED » yO (G9 TOF OWE
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ene
= Of

en, Vg! wb O17 rad | GyED Be Se (a

PHHHPHHKHPHPHPOPODAVAHEH
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HE HK
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= LED can operate at lower current densities than the injection laser.
= The emitted photons have random phases and the device is an

i
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incoherent optical source.

|\
@ LED has a much wider spectral line-width compared to Injection ~
laser. )

@ This gives line-widths of 30 to 40 nm for GaAs-based devices


——
i)

operating at room temperature.


KH —

™ The LED supports many optical modes and is therefore used as


a
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multimode source.
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Ke = =

€ ry a ™ Generally lower optical power relative to injection lasers


e ‘| = (microwalts),
aTI ) @ Usually lower modulation bandwidth

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- = ~

@ ® Reliability. LED does not exhibit catastrophic degradation and is far less sensitive DP poy | a
Si to gradual degradation than the injection laser ina 2

s BC ® Generally less temperature dependence’ The output light is less affected by Cae tri
a hl” 2 temperature. LED is not a threshold device and therefore raising the temperature ee ren
= i does not increase the threshold current above the operating point ,
ane = Simpler drive circuitry’ generally lower drive current and reduced temperature “le
2 dependence makes temperature compensation circuits unnecessary, ~ oe
=
on™ 2 ® Linearity LED has a linear output against current characteristic. This can prove Py us
—— 2 i age when analog modulation is concemed 2
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@ The absence of optical amplification through stimulated emission in


the LED tends to limit the internal quantum efficiency.
® Internal quantum efficiency: ratio of generated photons to injected
electrons.
@ Non radiative recombination occurs due to crystalline imperfections
and impurities.
= At best, an internal quantum efficiency of 50% is achieved for
simple homojunction devices.
© Using double heterojunction (DH) structures quantum efficiency of
60 to 80% can be reached.
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ry total number of carrier recomb
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unit volume

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per unit volume
domel, offe d aS ei bg, af Te Fl = t
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re oA =
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— =———
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st =

» Radiation geometery for an LED is Lambertian.


» The surface radiance is constant in all directions.
» Surface radiance: the power radiated from a unit area
Bie)

into a unit
solid angle
> If we consider the intensity perpendicular to the planar surface
Jp,
4 }-

it is reduced on the sides in proportion to the cosine of the viewing


———=
it

angle @.
® A further loss is encountered when coupling the light output into a
Tas

fiber.

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The Lambertian intensity distribution typical ofa planar LED.

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The principle operation of DH LED:


ol) CVA p-type GaAs layer sandwiched between a p-type AlGaAs and an n-type
_s AlGaAs layers.
—_

a) Q A forward bias is applied.


— - Q Electrons from the n-type layer are injected through the p-n junction into the p-
—— type GaAs layer, where they become minority carriers
eo Ol Thesenminority carriers diffuse away from the junction, recombining with the
— majority carriers,
8 O Photons are produced with energy corresponding to the band-gap energy of the
— p-type GaAs layer
ie O Fl ectroluminescence only occurs in the GaAs junction.
@ Q) Light is emitted from the device without absorption because the band-gap
a” | energy in the AlGaAs layer is large in comparison with that in GaAs
ae a oa chy Ad

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ve

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2. with applied forward bias. Meerionetni=-—— | |
aA . , a |
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- @ Surface emitter th ieeb
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m Resonant cavity LED
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2 4- > Planar a D
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a
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8 p-type
8 epitaxial —s
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e n-type substrate contacts

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3 The simplest structure
3 Fabricated on GaAs substrate
3 Gives Lambertian spontaneous emission
5 The radiance is low
3
3
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Ohmic
contacts P-type
Dome LED:
A hemisphere of n-type GaAs is forned around a diffused p-type region.
Higher external power efficiency than the planar LED.
= = T : + Fa 4 - a,
elt aw A Ga 5 Uns Joly —otogoy | 5 plat yy AM ey ot L, ol ED: we

P
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AlGaAs DH surface-emitting LED


To obtain high radiance, the emission is resricted to a small active region within the device

r
PW Ps
P
PP
PP
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Edge emitter LED
m@ High radiance
m Jt takes advantage of transparent guiding layer with a very thin active layer
(50 te 100m)
= Narrow beam in the plane perpendicular to the junction, with a half power width
of around 30
m= A Lambertion output in the plane of the junction, with a half power width of
around 120
e
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confinement Cs of L
layers Optical
guiding
layers , 4
bowel gaP wv (sa ee

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The structure of a stripe geometry DH AlGaAs edge-emitting LED


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——@>

ign Super-luminescence diode (SLD):


t~. ® High output power
a ® Directional output beam
— oe ® Narrow spectral beam
=~ . .
- ® Increased modulation bandwidth over that of more
— conventional LEDs.
La
— 2

a 2

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i
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Light = p-InP

n-InP
‘n-InGaAsP p-InP substrate
n-[nP
i } a)
o-[nGaAsP (active)
\ pine

Super-luminescence LED
as aoe a) AlGaAs contact stripe SLD
tear b) High output power InGaAsP SLD
‘Os / O |.

Rolw lv Ga AsP .) ae oe 9 lw 1 v fe

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re 5 iV / ‘ay »f ¢ i Li f = ;

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LED characteristics 23222


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Optical output power:|


= LED is a very linear device in comparison with the majority of
injection lasers.
® LEDs are more suitable for analog transmission where sever
constraints are put on the linearity of the optical source.
™TIt is often necessary to use some form of linearizing circuit
technique (e g. negative feedback).
= Internal quantum efficiency of LEDs decreases exponentially with
increasing temperature.

12 a
10 10 (b)

Light &F Light 8


output output
(mW) (mw)
4 4
2 2 oo
0 = 0 i i 5
100 200 39 100 200 300
aaa rshe sn) Current (mA)
avo Q2avVVvVVV

Light output power into air against dc. drive current


a) An AJGaAs surface emitter with 50 ym diameter dot contact
b) An AlGaAs edge emitter with a 65 ym wide stripe and 100 jam length

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Light output temperature a

TTT
dependence for three important

AVA
LED structures emitting at a _—>Pt ical

TT

VN
wavelength of 1.3 ym.

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power
(mW)
SLED
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ur SD eect
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i
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0 20 40 60 80

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Temperature (°C)

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Light output against current characteristic
at various ambient temperatures for an
ay
InGaAsP ridge waveguide SLD. Light
output 2} qb go
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i - i ay!
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200 250
iF

100 150
Current (mA)
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P
P
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.

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=) a oe q y
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= . Output Spectrum "4 SY
5 . f/f —_=- “ ye ab ‘ L Cet
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® The spectral width of an LED operating at room temperature in the 0.8 to 0.9 pm
wavelength band is usually between 25 to 45 nm at the half maximum intensity
points
® For materials with smaller band-gap energies operating in the 1.1 to 1.7 um
wavelength region, the line-width tends to increase to around 50 to 160 nm.
s The output spectra also tend to broaden with increase in temperature.
em It may be necessary to utilize heat sink with LEDs for certain optical fiber
communication applications, although this is far less critical than the cooling
requirements for injection lasers.
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LED output spectra:

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a) For an AlGaAs surface emitter with doped active region.

s>
b) For an InGaAsP surface emitter showing both the li ghtly doped and heavily doped cases.

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i e t 04> = dm d) (a/ or arlb Saw


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m a eis to transmit information via optical fiber communication

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information signal.
™ This property may be intensity, frequency, phase or polarization

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with either digital or analog signals.

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= Most fiber systems in the medium to long distance range, use digital

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intensity modulation.

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