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Xuefeng Guo
Hongliang Chen
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Contents
Preface ix
Author Biographies xi
List of Acronyms and Abbreviations xiii
1 Introduction 1
1.1 Different Interfaces in OFETs 1
1.2 Brief Historic Overview of Interface Engineering in OFETs 3
1.3 Scope of the Book 3
3 Semiconductor/Semiconductor Interface 33
3.1 Influence of Additives on a Material’s Nucleation and Morphology 37
3.1.1 Solvent Additives 37
3.1.2 Nucleating Agents 41
3.1.3 Template-Mediated Crystallization 43
3.1.4 Blending with Insulating Polymers 45
3.1.5 Blending with Polymer Elastomer: Nanoconfinement Effect 50
3.2 Enhancing the Performance Through Semiconductor
Heterojunctions 55
3.2.1 Planar Bilayer Heterostructures 57
3.2.2 Molecular-Level Heterojunction 61
3.2.3 Supramolecular Arrangement of the Heterojunctions 64
vi Contents
4 Semiconductor/Electrode Interface 77
4.1 Work Function Tuning for Better Contact 79
4.1.1 SAM Modification 80
4.1.2 Charge Insertion Layer Modification 84
4.1.3 Polymer-Based Electrodes 89
4.1.4 Carbon Nanomaterial-Based Electrodes 92
4.1.5 Covalent Bond Formation at the Molecular Level 97
4.2 Installing Switching Effects at Semiconductor/Electrode Interface 100
References 185
Index 251
ix
Preface
Author Biographies
Xuefeng Guo received his PhD in 2004 from the Institute of Chemistry, Chinese
Academy of Sciences, Beijing. From 2004 to 2007, he was a postdoctoral research
scientist at the Columbia University Nanocenter. He joined the faculty as a professor
under the “Peking 100-Talent” Program at Peking University in 2008. In 2012, he
won the National Science Funds for Distinguished Young Scholars of China. His
current research is focused on functional nanometer/molecular devices. Professor
Xuefeng Guo has authored over 210 scientific publications and has received
numerous scientific awards, including the First prize of Ministry of Education
Natural Science Award.
Hongliang Chen received his PhD in 2016 from the College of Chemistry
and Molecular Engineering, Peking University, under the guidance of Professor
Xuefeng Guo. From 2016 to 2018, he worked as a research scientist at the Core
R&D department in Dow Chemical Company. Then he moved to Northwestern
University in United States and worked as a postdoctoral research fellow in Professor
Sir Fraser Stoddart’s group from 2018 to 2021. He joined Zhejiang University as
an assistant professor under “ZJU 100-Talent” Program in June 2021. His research
interests are focused on organic functional devices and molecular electronics.
xiii
1D one-dimensional
2D two-dimensional
3D three-dimensional
AFM atomic force microscopy
AZOs azobenzenes
BCB divinyltetramethyldisiloxane-bis(benzocyclobutene)
BTBT [1]benzothieno[3,2-b][1]-benzothiophene
C8 -BTBT 2,7-dioctyl[1]-benzothieno[3,2-b][1]benzothiophene
CIL charge insertion layer
CNTs carbon nanotubes
CT charge-transfer
D–A donor–acceptor
DAE diarylethene
DNTT dinaphtho[2,3-b:2′ ,3′ -f ] thieno[3,2-b]thiophene
DOS densities of state
EA energy gap of OSC
EF Fermi level of electrodes
EVAC vacuum energy level
FLG few-layer graphene
GOs graphene oxides
Gr graphene
HMDS hexamethyldisilazane
HOMO highest occupied molecular orbital
k relative permittivity or dielectric constant
LB Langmuir–Blodgett
LUMO lowest unoccupied molecular orbitals
MWCNTs multiwalled carbon nanotubes
NDI naphthalenediimide
NHCs N-heterocyclic carbenes
OFET organic field-effect transistor
OLET organic light-emitting transistor
OSCs organic semiconductors
P3HT poly(3-hexylthiophene)
xiv List of Acronyms and Abbreviations
PA Phosphonic acid
PCBM [6,6]-phenyl-C61 -butyric acid methyl ester
PCMs photochromic molecules
PDI perylenediimide
PDMS polydimethylsiloxane
PEN polyethylene naphthalate
PHBD photo hybrid bilayer dielectric
PLA polylactide
PMMA poly(methyl methacrylate)
POM polyoxometalate
PS polystyrene
PSA poly(stearyl acrylate)
PSS poly(sodium-p-styrenesulfonate)
PVA poly(vinyl alcohol)
P(VDF–TrFE) poly(vinylidene fluoride-trifluoroethylene)
PVP poly(vinyl phenyl)
PVPyr poly(4-vinylpyridine)
PαMS poly(α-methylstyrene)
RGO reduced graphene oxide
SAM self-assembled monolayer
SAMFETs self-assembled monolayer field-effect transistors
SEBS poly(styrene-b-(ethylene-co-butylene)-b-styrene)
SEM scanning electron microscopy
SLG single-layer graphene
SPs spiropyrans
SWCNTs single-walled carbon nanotubes
TCNB 1,2,4,5-tetraacyanobenzene
TCNQ tetracyanoquinodimethane
TEM transmission electron microscopy
TIPS–pentacene 6,13-bis(triisopropylsilylethynyl) pentacene
TTF tetrathiafulvalene
VD source–drain voltage
VG gate voltage
V th threshold voltage
WEG weak epitaxy growth
WF work function
𝛾 tot total surface energy
𝜀0 vacuum permittivity
𝜇 DT aligned dipole moment of the SAM
𝜇 M–S M—S bond dipole interface
φm electrode work function
1
Introduction
Interface Engineering in Organic Field-Effect Transistors, First Edition. Xuefeng Guo and Hongliang Chen.
© 2023 WILEY-VCH GmbH. Published 2023 by WILEY-VCH GmbH.
2 1 Introduction
(a) (b)
(c) (d)
Figure 1.2 Interface engineering of interfaces in OFETs. (a) Interface within the
semiconductor layers, (b) semiconductor/electrode interface, (c) semiconductor/dielectric
interface, and (d) semiconductor/environment interface. SAM: self-assembled monolayer;
OSC: organic semiconductor; CIL: charge insertion layer.
Over the past two decades, extensive efforts [6, 8, 9, 16] have been devoted to the
modification of interfaces in organic field-effect transistors (OFETs), including phys-
ical modification methods, such as encapsulation or insertion on the surface, and
chemical modification methods, such as covalently bonded self-assembled mono-
layer (SAM) modification.
Interface Engineering in Organic Field-Effect Transistors, First Edition. Xuefeng Guo and Hongliang Chen.
© 2023 WILEY-VCH GmbH. Published 2023 by WILEY-VCH GmbH.
8 2 Interfacial Modification Methods
(c)
OH
CF3 M
M
N M X
N N X Me3N X
H X N
x y z X Me3N X
O
O N
N OH
HO N
O
x 1-x O N
N S
OH S
M = Na , Cs , NMe4 , PPh4 S
H2N O N O x
S
CF3 O 1-x
O N
NH2 NH
P1 X = –SO3 NMe3
N N N N
P2 X = –SO2NS2CF3
NMe3 X
H
a b c d
N N1 X = Br , I , OTf
H 2N NH2
N Br Br
O O
N H
S N N
n F 3C O– n N
– B n
OTf – N N
N
N
Blm4– Br TPA+
N+ X X +N N+ X X +N M SO3–
DPA – M = Cs+, TPA+, PEDOT+
X = OTf –, DPA – X = F –, Br–, Blm4–
PFN+X PSS–M
PFA+X
(d)
Figure 2.1 Chemical structures of the charge insertion layer (CIL). (a) Metal oxides,
(b) metal salts, (c) small molecules, (d) polymers, and (e) other materials.
[75, 76], whose work functions range from very low (φ ≈ 3 eV for ZrO2 ) to extremely
high (φ ≈ 7 eV for V2 O5 ), are suitable for modifying different metals with matched
energy levels. After introducing the CIL, the thickness of the depletion layer
between the metal and metal oxide decreases to a few nanometers, producing a
reachable distance for tunneling injection, and the contact resistance could be
significantly reduced once the tunneling injection is dominant. The CIL layer can
2.1 Noncovalent Modification Methods 9
also act as a protection layer against the diffusion [77] of metals from electrodes or
the permeation [78] of O2 or H2 O into the active layer, thus improving the device
stability.
Metal salts are another big family of inorganic materials working as CILs
(Figure 2.1b) [79, 80]. They experience a similar mechanism as metal oxides.
One of the benefits of using metal salts as CILs is their compatibility with the
solution-process method. For example, CuSCN [81, 82] can be spin-casted on Au
electrodes as a novel CIL with an intrinsic electron-blocking property. However,
there are some drawbacks of metal salts when applying them as CILs. First, the
thickness of the CIL affects electron transport. A thicker layer of CsF [83] (more
than 0.6 nm) decreased the mobility owing to its insulating nature. Second, when
depositing a CIL into ambipolar OFETs by using a single component, the outcome
performance of p- and n-channels cannot be enhanced simultaneously. This
problem could be solved by mixing two different materials to form a hybrid CIL
[84]. The injection barrier for different types of carriers was tuned finely according
to the molecular ratio of the two compounds.
When it comes to organic small molecules as CILs (Figure 2.1c), i.e. charge-
transfer (CT) complex (2) [85], metal complex (3–5) [86, 87], metal tetraphenyl-
porphyrin and phthalocyanine (6–10), [88] and N-heterocyclic compounds (11–15)
[89], direct CT occurs at the interface between the organic CIL and the semicon-
ductor, which helps to reduce the contact resistance by the additional interface
dipole. However, a problem that still exists is the possibility of matrix–dopant
hybridization [90, 91]. The organic polymers with dipolar groups [23, 92, 93]
(16 and 17) (Figure 2.1d) can also act as electrode surface modifiers to achieve
electrodes with a low work function. Polyelectrolytes (18–22), which comprise the
groups capable of being charged with cations or anions, were proven recently to be
a promising CIL to achieve ohmic contacts with a wide range of work functions
(3.0–5.8 eV) [23].
Other materials (Figure 2.1e), such as DNA [94] and graphene oxides (GOs)
[95–97], have also been used as CILs. The presence of phosphate groups in the
DNA leads to a dipole layer, which could change the orientation in response to
applied gate voltages and enhance the charge injection of both types of carriers.
When GOs were applied as CILs in OFETs, the improvement in device performance
could be attributed to the good contact nature of carbon-based materials with
semiconductors, which will be discussed in Section 3.3.2.
(a) (b)
10
Polymer substrate
8
50 nm
6
μm
8
50 nm
6
μm
0 nm
0
2D hexagonal packing 0 2 4 6 8 10
μm
(e) (f) (g)
Figure 2.2 Modification of polymer dielectrics. (a) Schematic representation showing the
bilayer dielectric made from an initiated chemical vapor deposition process. (b) Molecular
structures of the interfacial layer and the bulk dielectric layer. (c) A schematic structure of
the vertical phase separation of the blended dielectric. (d) Schematic representation
showing the effect of the polaronic disorder and carrier concentration in OFETs with three
dielectrics. (e) A few-layer triptycene film featuring 2D nested hexagonal packing and
one-dimensional (1D) layer stacking on a parylene dielectric. (f) Molecular structure of the
triptycene molecule. (g) Atomic force microscopy (AFM) height images of evaporated OSC
films on parylene (top) and triptycene-coated parylene (bottom) gate dielectrics.
Source: (a, b) Adapted from Pak et al. [34]. (c, d) Adapted from Khim et al. [106].
(e–g) Reproduced from Yokota et al. [107], © 2018 Springer Nature.
12 2 Interfacial Modification Methods
(ii) The phosphonic acid (PA) and its phosphonate ester derivative-based SAM
molecules[111], which can form PA–SAMs on a large range of inorganic oxide
dielectrics, including high-k materials, by multidentate binding of strong
covalent P–O–M anchoring (M stands for metal atom). Under normal ambient
conditions, phosphonic acid molecules do not react chemically on the surface
of SiO2 [123].
Figure 2.4 Molecular structures of SAMs used to modify the SiO2 surface. Surface
modification with organosilanes (71–102) is the most common method. Phosphonic acid
(103–106) can also be used in some cases.
Table 2.1 The device performance of the devices with SAM-modified SiO2 dielectrics.
Average
OSC OSC film Silane SAM mobility On/off
Type material deposition SAM preparation Electrode (highest) ratio References
Average
OSC OSC film Silane SAM mobility On/off
Type material deposition SAM preparation Electrode (highest) ratio References
−4 4
p PTAA Spin-coating FPPTS Immersion BC Au 5.2 (±1.3) × 10 10 [137]
p PTAA Spin-coating MPTMS Vacuum BC Au 5.2 (±1.5) × 10−4 105 [137]
p PTAA Spin-coating APTES Vacuum BC Au 1.4 (±0.7) × 10−4 104 [137]
p PTAA Spin-coating TAATS Immersion BC Au 2.0 (±0.1) × 10−4 105 [137]
p PTAA Spin-coating ODTS Immersion BC Au — — [137]
p Pentacene Thermal ODTMS Spin-casting TC Au 2.8 ± 0.2 106 [138]
evaporation
p Pentacene Thermal ODTS Vapor TC Au 0.52 ± 0.04 105 [138]
evaporation
n C60 Thermal ODTMS Spin-casting TC Au 4.7 ± 0.41 107 [138]
evaporation
n C60 Thermal ODTS Vapor TC Au 0.27 ± 0.15 105 [138]
evaporation
n PTCDI-C4F7 Thermal ODTMS Spin-casting TC Au 1.4 106 [138]
evaporation
n PTCDI-C4F7 Thermal ODTS Vapor TC Au 0.72 — [138]
evaporation
p Pentacene Thermal 9-Ant-PA T-BAG treatment TC Au 0.8 (0.9) 107 [139]
evaporation
p Pentacene Thermal 2-Ant-PA T-BAG treatment TC Au 1.6 (2.4) 107 [139]
evaporation
p Pentacene Thermal DiPh-2-Ant-PA T-BAG treatment TC Au 1.8 (3.6) 107 [139]
evaporation
p Pentacene Thermal DiNaph-2- T-BAG treatment TC Au 2.5 (4.7) 107 [139]
evaporation Ant-PA
p P-BTDT Thermal High humidity Immersion TC Au 0.22 (0.250) 108 [125]
evaporation (HH)-ODTS
p P-BTDT Thermal anhydrous Immersion TC Au 0.085 (0.090) 108 [125]
evaporation (AA)-ODTS
p Pentacene Thermal ODTS Vapor TC Au 0.517 ± 0.015 — [140]
evaporation
p Pentacene Thermal FDTS Vapor TC Au 0.449 ± 0.002 — [140]
evaporation
p C10–DNF–VV Edge-cast DTES Vapor TC Au 1.3 — [141]
p C10–DNF–VW Edge-cast DTES Vapor TC Au 1 — [141]
p C10–DNF–VW Edge-cast β-PhTS Vapor TC Au 1.1 — [141]
p Pentacene OMBD ODTS Dipping at −30 ∘ C TC Au 0.46 (0.61) — [142]
p Pentacene OMBD ODTS Dipping at −5 ∘ C TC Au 0.31 — [142]
p Pentacene OMBD ODTS Dipping at 20 ∘ C TC Au 0.19 — [142]
p P3HT Spin-coatingb) OTS Casting BC Au 0.156 ± 0.010 103 [39]
Ambipolar PNDTI-BT-DT Spin-coated ODTS Immersion TC Au 0.2 (p)/0.28 (n) 103 (p)/103 (n) [143]
Ambipolar PNDTI-BT-DT Spin-coated FDTES Vapor TC Au 0.43 (p) 106 [143]
Ambipolar PNDTI-BT-DT Spin-coated MAPTES Immersion TC Au 0.24 (n) 106 [143]
Figure 2.5 Chemical structures of SAMs used to modify high-k inorganic dielectrics.
between phosphonic acids. Once the monolayer is formed, the SAM [150, 151]
shows more resistance of phosphonate to hydrolysis than siloxane. PA–SAMs
[152, 153] can also be used to modify transparent electrodes based on metal oxides,
such as indium tin oxide (ITO), with almost no impact on the transparency. To
get a comprehensive understanding of the relationship between SAM materials,
preparation methods, and FET performances, we have listed below recent works of
SAM-modified high-k dielectrics, which are shown in Table 2.2.
Table 2.2 The device performance of the devices with SAM-modified high-k dielectrics.
3
CeO2 –SiO2 Electron-beam HMDS Pentacene p Vacuum — 0.32 10 [154]
deposition
Al2 O3 –SiO2 Magnetron COOH- Pentacene p Thermal −18 0.17 — [155]
sputtering anthracene evaporation
Al2 O3 –SiO2 Magnetron Ba-C10 Pentacene p Thermal −9 0.35 — [155]
sputtering evaporation
HfO2 –SiO2 Sol–gel ODPA Pentacene p Thermal −0.53 0.15 105 [156]
evaporation
HfO2 –SiO2 Sol–gel π-σ-PA1 Pentacene p Thermal −0.41 0.22 105 [156]
evaporation
HfO2 –SiO2 Sol–gel π-σ-PA2 Pentacene p Thermal −0.41 0.15 105 [156]
evaporation
Al2 O3 O2 plasma treated ODPA Pentacene p Thermal — 0.4 — [157]
Al evaporation
Al2 O3 O2 plasma treated ODPA F16CuPc n Thermal — 0.01 — [157]
Al evaporation
HfO2 Sol–gel ODPA PTzQT-14 p Spin-coating −0.32 0.10 ± 0.01 (0.11) 105 [158]
HfO2 flexible Sol–gel ODPA PTzQT-14 p Spin-coating −0.85 0.061 ± 0.0045 105 [158]
(0.068)
HfO2 Sol–gel π-σ-PA Pentacene p Thermal −0.5 0.32 105 [159]
evaporation
(Continued)
Table 2.2 (Continued)
5
HfO2 Sol–gel ODPA Pentacene p Thermal −0.6 0.3 10 [159]
evaporation
HfO2 Sol–gel π-σ-PA TIPS-PEN p Drop cast −0.5 0.38 105 [159]
HfO2 Sol–gel ODPA TIPS-PEN p Drop cast — — — [159]
HfO2 –SiO2 Sol–gel C18-PA Pentacene p Thermal −1.06 0.25 ± 0.08 106 [160]
evaporation
HfO2 –SiO2 Sol–gel C16-PA Pentacene p Thermal −0.88 0.30 ± 0.03 106 [160]
evaporation
HfO2 –SiO2 Sol–gel C14-PA Pentacene p Thermal −0.86 0.82 ± 0.03 106 [160]
evaporation
HfO2 –SiO2 Sol–gel C12-PA Pentacene p Thermal −0.69 1.09 ± 0.02 106 [160]
evaporation
HfO2 –SiO2 Sol–gel C10-PA Pentacene p Thermal −0.59 0.84 ± 0.13 106 [160]
evaporation
HfO2 –SiO2 Sol–gel C8-PA Pentacene p Thermal −0.58 0.74 ± 0.03 106 [160]
evaporation
HfO2 –SiO2 Sol–gel C6-PA Pentacene p Thermal −0.56 0.56 ± 0.04 106 [160]
evaporation
Al2 O3 –SiO2 O2 plasma treated PhO-19-PA TIPS-PEN p Spin-cast −0.7 to −0.9 0.02–0.11 106 [161]
Al on Si/SiO2
Al2 O3 –SiO2 O2 plasma treated PhO-19-PA PC61BM n Spin-cast 0.4–0.6 0.02–0.06 106 [161]
Al on Si/SiO2
Al2 O3 –SiO2 O2 plasma treated PhO-19-PA Pentacene p Thermal −0.8 0.9–0.11 106 [161]
Al on Si/SiO2 evaporation
Al2 O3 –SiO2 O2 plasma treated C10-PA DH4T p Thermal −1.5 0.024 106 [162]
Al on Si/SiO2 evaporation
Al2 O3 –SiO2 O2 plasma treated PHDA DH4T p Thermal −1.3 0.018 106 [162]
Al on Si/SiO2 evaporation
Al2 O3 –SiO2 O2 plasma treated F15C18-PA DH4T p Thermal −0.4 0.024 106 [162]
Al on Si/SiO2 evaporation
AlOx /banknote O2 plasma treated ODPA DNTT p Thermal −1.0 to −1.4 — 104 (105 ) [163]
Al evaporation
AlOx /banknote O2 plasma treated ODPA F16CuPc n Thermal — 0.005 — [163]
Al evaporation
AlOx O2 plasma treated Phenyl PA DH6T p Thermal −1.100 ± 0.24 0.011 ± 0.003 — [164]
Al evaporation
AlOx O2 plasma treated Phenyl PA Pentacene p Thermal −1.780 ± 0.07 0.046 ± 0.03 — [164]
Al evaporation
AlOx O2 plasma treated Phenyl PA F16CuPc n Thermal 0.31 ± 0.01 0.061 ± 0.005 — [164]
Al evaporation
AlOx O2 plasma treated C14-PA DH6T p Thermal −0.860 ± 0.08 0.034 ± 0.007 — [164]
Al evaporation
AlOx O2 plasma treated C14-PA Pentacene p Thermal −1.610 ± 0.05 0.833 ± 0.106 — [164]
Al evaporation
(Continued)
Table 2.2 (Continued)
AlOx O2 plasma treated C14-PA F16CuPc n Thermal 0.330 ± 0.180 0.164 ± 0.056 — [164]
Al evaporation
AlOx O2 plasma treated 4T-C12-PA DH6T p Thermal −0.80 ± 0.14 0.014 ± 0.005 — [164]
Al evaporation
AlOx O2 plasma treated 4T-C12-PA Pentacene p Thermal −1.37 ± 0.07 0.001 ± 0.0001 — [164]
Al evaporation
AlOx O2 plasma treated 4T-C12-PA F16CuPc n Thermal 0.81 ± 0.070 0.014 ± 0.008 — [164]
Al evaporation
AlOx O2 plasma treated BTBT-C12-PA DH6T p Thermal −0.75 ± 0.02 0.015 ± 0.002 — [164]
Al evaporation
AlOx O2 plasma treated BTBT-C12-PA Pentacene p Thermal −1.23 ± 0.240 0.029 ± 0.022 — [164]
Al evaporation
AlOx O2 plasma treated BTBT-C12-PA F16CuPc n Thermal 0.66 ± 0.04 0.031 ± 0.025 — [164]
Al evaporation
AlOx O2 plasma treated C60C18-PA DH6T p Thermal 0.450 ± 0.04 0.016 ± 0.001 — [164]
Al evaporation
AlOx O2 plasma treated C60C18-PA Pentacene p Thermal −0.51 ± 0.07 0.155 ± 0.076 — [164]
Al evaporation
AlOx O2 plasma treated C60C18-PA F16CuPc n Thermal 0.83 ± 0.09 0.004 ± 0.002 — [164]
Al evaporation
AlOx O2 plasma treated F15C18-PA DH6T p Thermal 0.640 ± 0.01 0.022 ± 0.006 — [164]
Al evaporation
AlOx O2 plasma treated F15C18-PA Pentacene p Thermal −0.60 ± 0.04 0.097 ± 0.067 — [164]
Al evaporation
AlOx O2 plasma treated F15C18-PA F16CuPc n Thermal 1.890 ± 0.120 0.043 ± 0.014 — [164]
Al evaporation
AlOy /TiOx Spin-cast ODPA TIPS-TAP n Thermal 0.83 ± 0.08 1.3–1.8 — [40]
evaporation
AlOy /TiOx Spin-cast PA1 TIPS-TAP n Drop cast 1.1 ± 0.22 1.2 (2.5) 105 [40]
AlOy /TiOx Spin-cast PA2 TIPS-TAP n Drop cast 0.9 ± 0.25 0.88 — [40]
AlOy /TiOx Spin-cast PA3 TIPS-TAP n Drop cast — — — [40]
AlOy /TiOx Spin-cast PA4 TIPS-TAP n Drop cast 1.2 ± 0.25 0.94 — [40]
AlOy /TiOx Spin-cast PA5 TIPS-TAP n Drop cast 1.2 ± 0.24 0.97 — [40]
AlOy /TiOx Spin-cast PA1 TIPS-TAP p Drop-cast — 1.13 — [40]
AlOy /TiOx Spin-cast PA4 TIPS-TAP p Drop-cast — 0.95 — [40]
Al2 O3 –SiO2 O2 plasma treated BA-11-PA Pentacene p Thermal 26.0 ± 12.3 3.5 ± 0.28 106 [165]
Al on Si/SiO2 evaporation
Al2 O3 –SiO2 O2 plasma treated 12-PD-PA Pentacene p Thermal 14.0 ± 7.3 3.15 ± 0.31 106 [165]
Al on Si/SiO2 evaporation
Al2 O3 –SiO2 O2 plasma treated DDPA Pentacene p Thermal 18.6 ± 3.8 3.51 ± 0.39 106 [165]
Al on Si/SiO2 evaporation
Al2 O3 –SiO2 O2 plasma treated PhO-19-PA Pentacene p Thermal 22.5 ± 7.5 0.91 ± 0.04 106 [165]
Al on Si/SiO2 evaporation
(Continued)
Table 2.2 (Continued)
6
Al2 O3 –SiO2 O2 plasma treated ODPA Pentacene p Thermal 27.4 ± 6.8 0.98 ± 0.21 10 [165]
Al on Si/SiO2 evaporation
Al2 O3 –SiO2 O2 plasma treated Trip-12-PA Pentacene p Thermal 42.1 ± 6.7 0.51 ± 0.15 105 [165]
Al on Si/SiO2 evaporation
AlOx /PEN foil Potentiostatic C14-PA DNTT p Thermal −0.61 ± 0.13 0.88 ± 0.13 (1.6) 107 [166]
anodization of Al evaporation
AlOx /SiO2 Potentiostatic C14- PA DNTT p Thermal 2 −0.76 107 [166]
anodization of Al evaporation
AlOy /TiOx Spin-coating CDPA Pentacene p Thermal — 3.86 ± 0.47 (5.7) — [167]
evaporation
AlOy /TiOx Spin-coating CDPA Pentacene p Thermal — 2.21 ± 0.46 (2.9) — [167]
evaporation
AlOy /TiOx Spin-coating CDPA C60 n Thermal — 2.98 ± 0.83 (5.1) — [167]
evaporation
AlOy /TiOx Spin-coating CDPA C60 n Thermal — 0.66 ± 0.28 (1.1) — [167]
evaporation
AlOy /TiOx Spin-coating CDPA TIPS-PEN p Drop-cast — 1.64 ± 0.55 (2.7) — [167]
AlOy /TiOx Spin-coating CDPA TIPS-TAP n Drop-cast — 0.78 ± 0.32 (1.44) — [167]
Al2 O3 Atomic layer HC18−PA DNTT p Thermal −0.6 2 — [168]
deposition (ALD) evaporation
Al2 O3 Atomic layer HC18−PA DNTT p Thermal −0.4 2.3 — [168]
deposition (ALD) evaporation
Al2 O3 Atomic layer FC18−PA DNTT p Thermal 1.2 1.8 — [168]
deposition (ALD) evaporation
Al2 O3 Atomic layer FC18−PA DNTT p Thermal 1.3 2.1 — [168]
deposition (ALD) evaporation
AlOx /PEN foil O2 plasma treated HC14-PA DNTT p Thermal — 2.9 ± 0.3 106 [169]
Al evaporation
AlOx /PEN foil O2 plasma treated FC18-PA DNTT p Thermal — 2.2 ± 0.2 106 [169]
Al evaporation
AlOx /PEN foil O2 plasma treated HC14-PA DPh-DNTT p Thermal — 4.1 ± 0.1 106 [169]
Al evaporation
AlOx /PEN foil O2 plasma treated FC18-PA DPh-DNTT p Thermal — 1.9 ± 0.1 106 [169]
Al evaporation
AlOx /PEN foil O2 plasma treated HC14-PA C10-DNTT p Thermal — 3.6 ± 0.1 106 [169]
Al evaporation
AlOx /PEN foil O2 plasma treated FC18-PA C11-DNTT p Thermal — 1.1 ± 0.04 106 [169]
Al evaporation
AlOx /PEN foil O2 plasma treated HC14-PA N1100 n Thermal — 0.5 ± 0.04 106 [169]
Al evaporation
AlOx /PEN foil O2 plasma treated FC18-PA N1100 n Thermal — 0.8 ± 0.1 106 [169]
Al evaporation
AlOy /TiOx Spin-coating CDPA TIPS-TAP n Drop-cast 11–15 7.6 ± 1.6 106 [41]
AlOy /TiOx Spin-coating CDPA TIPS-TAP n Dip-coated 11–15 7.6 ± 1.9 106 [41]
AlOy /TiOx Spin-coating CDPA TIPS-TAP n Thermal 18–22 5.1 ± 1.2 106 [41]
evaporation
28 2 Interfacial Modification Methods
(a) (b)
Figure 2.6 Organic semiconducting molecular design for SAMFEFs. (a) Schematic
illustration showing a SAMFET device configuration. (b) Molecular design strategy of a
typical SAMFET semiconductor. Source: (a, b) Adapted from Schmaltz et al. [42], © 2017
American Chemical Society.