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bined with spin-polarized current switch- 2. NANO-FABRICATION METH- a Raith 150 scanning electron microscope
ing suggested the possible MRAM designs OD AND NANO-SCALE MTJ using positive E-beam resist of polymethyl
with high-density magnetic memory cells, PROPERTIES methacrylate (PMMA) and negative E-
enhanced thermal stability and reduced Nowadays, with science and technology beam resist of hydrogen silsesquioxane
power consumption [21-26]. The current- developing rapidly, there are many meth- (HSQ) techniques. The nano-sized MTJ
driving MRAM devices with the density ods to deposit nanoscale thick metallic pillar including the top resist was then
or capacity over than 1 Gbit/inch2 can be or nonmetallic films, such as molecular buried by SiO2 deposition in a magnetron
expected to come true in next few years. beam epitaxy (MBE), sputtering, electron sputtering system. Finally, the resist and
beam evaporation, chemical vapor depo- SiO2 on the top of a nano-size MTJ were
The third kind of important applications sition (CVD), and so on. MTJ films are removed using a lift-off process mentioned
for MTJ and TMR is to develop multifari- mainly comprised of nanoscale magnetic above, before the top electrode was pat-
ous magneto-sensitive sensors since the multilayers insulated by a nonmagnetic terned in the perpendicular direction.
high TMR effect was discovered. The layer, together with seed layers and cap- The transport properties was measured
micro- and nano-scale patterned MTJs ping layers. Magnetron sputtering has using a standard four probe method or a
can be used as the key magneto-sensitive been widely applied to deposit MTJ stack Physical Properties Measurement System
elements for/in designing the various layers due to high deposition rate and (PPMS).
digital sensors, such as very weak mag- films quality. For an instance, selecting a
netic field sensors [27, 28], magnetic substrate Si(100)/SiO2 and cleaning it with For example, Fig. 1 shows scanning
bio-sensor [29-31], magneto-audiphone & conventional method first, a typical MTJ electron microscope (SEM) images for
hearing aids, motorcar magnetic sensors, stack layers with the spin-valve-type struc- arrays of nano-ring MTJs with outer
magnetic anti-counterfeit detector and ture of Ta(5)/Ir22Mn78(10)/Co75Fe25(2)/ diameters of 100, 300, 500, and 700 nm,
TMR cash detector, location sensors in Ru(0.75)/ Co60Fe20B20 (3)/Al(d nm)-oxide/ respectively, where the ring width is 30
vernier calipers and machine tools, angle Co60Fe20B20(2.5)/Ta(3)/Ru(5) (thickness nm. Fig. 2 shows SEM images for an array
or speed or accelerated-speed sensors for unit: nm) were then deposited on the of nano-size elliptic MTJs with the long
taximeter, tachometer, cyclometer or ac- substrate using an ULVAC TMR R&D and short axis of 40 and 30 nm.
celerometer etc. Magnetron Sputtering System (MPS-
4000-HC7) with a base pressure of 5 × Figure 3 shows the tunnel resistance
The other sorts of concernful applica- 10-7 Pa. The Al oxide barrier was made (R) and TMR ratio versus spin-polar-
tions for nano-scale patterned MTJs and by inductively coupled plasma (ICP) ized current (I) loops driven by a pulse
TMR effect can be expected for devel- oxidizing Al layer with the thickness of DC current for a typical spin-valve-type
oping the magnetic logic devices [32], d = 0.6 ~ 1.0 nm and an oxidation time Nanoring-MTJs with the outer diameter
nano-oscillators [33-36], spin torque diode of 10 ~ 60 s in a mixture of oxygen and of 100 nm and ring-width of 25 nm and
[37], double-barrier tunneling transistors argon at a pressure of 1.0 Pa in a separate barrier thickness of Al(0.60 nm)-oxide.
[38, 39] etc., which can be hopefully car- vacuum chamber. An in-plane magnetic For the NR-MTJ with a size of 5.89 knm2,
ried out some remarkable improvements field of about 100 Oe was applied to in- its TMR ratio of 18.2%, lower and higher
of information technology (IT) and semi- duce the uniaxial magnetic anisotropy of resistant of 285 Ω and 337 Ω, minimum
conductor integrate circuit industries in the magnetic layers. After deposition, the and maximum resistance-area product RA
the near future. MTJ films were subsequently annealed of 1.68 Ωμm2 and 1.98 Ωμm2 at RT were
at 265℃ for one hour to achieve optimal observed respectively. The critical value
In this paper we briefly introduce recent TMR ratio. Here the TMR ratio is defined IC of switching current between 500 and
investigations on Nano-scale patterned as TMR = (RAP − RP )/RP. 540 μA for the free Co60Fe20B20 (2.5 nm)
techniques, DC-pulsed-current-driven layer was observed at RT.
magnetization switching, spin-dependent The nano-fabrication process of nano-
transport properties of magnetic tun- sized MTJs can be based on electron beam The experiments and further simulations
nel junctions (MTJs) and their possible lithography, extreme ultraviolet lithogra- in nano-size ring-shaped MTJs show that
applications in spin-electronic devices. phy process, or nano-print technique etc. the spin transfer torque is a dominant fac-
We also summarize recent research on The MTJ stack films deposited on the tor for the observed magnetization current-
spin-dependent transport properties in Si(100)/SiO2 substrate were patterned into switching [24, 25]. Furthermore, the pulse
MgO(001)-based MTJs using first-princi- bottom electrode by ultraviolet optical li- DC current induces a circular magnetic
ples calculations, which can be referenced thography combined with argon ion beam field (Oersted field) of smaller than 20
for designing the STT-MRAM, nano-os- milling and reactive ion etching (RIE). The (Oe) at the outer boundary of the 100 nm-
cillators, magnetic logic, spin-transistor, nano-size active MTJ area was patterned diameter ring layer, which can affect the
and other spintronic devices in future. by electron beam lithography (EBL) with magnetization states as assisted-switching
current driving. Fig. 6(a) is one example current as shown in Fig. 5 at the electrodes right and bottom left drawing show one
for logic AND operation. We demonstrate A and B as logical 1 (0) of the inputs. The bridge branch with two sensors leg1 and
the operation sequences of the logic AND logic operation sequence as follows: (1) leg2 comprised of two uncovered MTJs.
gate. Firstly, we set the initial state R = The parallel configuration of magnetiza- The upper left and bottom right show
low (0) of MTJ by inputting current -I (0) tion can not be changed by applying 0 other bridge branch with one pair of leg3
from electrodes A, B, and C. The magne- (negative current) from electrode A and B and leg4 configured of two MTJs which
tization of the soft FM layer is parallel towhich corresponds to an output logical 0. were “shielded” by the permalloy film.
the alignment of the hard FM layer. This (2) The input electrode A and B are applied Using such Wheatstone bridge design,
configuration is low resistance state of 0 and 1 (negative and positive current) the sensitivity of TMR sensor can be
MTJ cell defined as logical 0 of output, individually. The direction of magnetiza- increased comparing with a magneto-
meanwhile, we define positive (negative) tion is unchanged due to lower density sensitive sensor consist of only one single
of the net current through the MTJ. The patterned MTJ element. For increasing
same case takes place if 1 is applied at the the break-down voltage and anti-jam-
input electrode A which is corresponding ming stability each bridge leg can also
to output 0. (3) As applying the logical 1 consist of series-wound MTJs with same
(positive current) at both input electrode A numbers.
and B, the magnetization direction of soft
FM layer is switched by the STT or spin The only sensors capable of detecting
polarized current. The logic output 1 is less than fT (10-15 Tesla) magnetic field
obtained by the antiparallel configuration have been suggested based on low-tem-
of magnetization. The logic AND is dis- perature superconducting loop and GMR
played completely in the truth table. Also, element mixed devices, operating at 4.2
Fig. 5: Schematic graph of magnetic logic
device based on nanosize elliptic or nanor- we can get logic function of OR, NOR, K [28]. Here, we show a magnetic field
ing shaped MTJ with spin-polarized current NAND, and XOR in similar way whose sensor design that combines a supercon-
driving. truth tables are shown in Fig. 6(b). ducting flux-to-field transformer with a
low-noise patterned-MTJ sensor as shown
Although there are still some difficul- in Fig. 8. It was designed a flux-to-field
ties to realize magnetic logic function, transformer formed of a large supercon-
such as technology of nanofabrication and ducting loop closed by a micrometer-sized
stabilization of devices, the magnetic logic constriction. When an external low-fre-
devices based on spin-polarized current quency field Ha is applied perpendicular to
open up way for the possibility of real- the superconducting loop, a supercurrent
izing all magnetic information processing is established to maintain the flux through
systems incorporated by both magnetic the loop. If this current flows through a
memory and logic. micro- or nano-scale constricted area, its
high surface current density will lead to a
3.3. Patterned MTJ and Superconduc- very high coplanar magnetic field above
tor-ring Mixed Magneto-sensitive and below the narrow part of the loop.
Device This field can be detected by the TMR
Figure 7 shows a typical TMR magnetic sensor, which is sensitive to the in-plane
sensor using Wheatstone bridge design field. Therefore, this superconductor/MTJ
for the general applications. The upper mixed devices can be expected to detect
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