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When a voltage is applied across a piece of silicon, as shown below, the thermally
generated free electrons in the conduction band, which are free to move randomly in
the crystal structure, are now easily attracted toward the positive end. This
movement of free electrons is one type of current in a semiconductive material and
is called electron current.
Formation of
Depletion Region
In a Diode
• For each electron that crosses the junction and
recombines with a hole, a pentavalent atom is
left with a net positive charge in the n region
near the junction, making it a positive ion. Also,
when the electron recombines with a hole in the
p region, a trivalent atom acquires net negative
charge, making it a negative ion.
• These two layers of positive and negative
charges form the depletion region, as shown
in Figure on the right.
• The term depletion refers to the fact that the
region near the pn junction is depleted of
charge carriers (electrons and holes) due to
diffusion across the junction.
UNBIASED P-N JUNCTION DIODE
Integrating electric field with
respect to with respect to
distance determines the
electric potential 𝑽. This
would also equal the built in
voltage ∆𝑽.
𝑽 = න 𝑬𝒅𝒙 = ∆𝑽 = 𝑽𝑩
For Silicon ∆𝑽 = 𝟎. 𝟕𝑽
For Germanium ∆𝑽 = 𝟎. 𝟑𝑽
𝟏
∴ 𝑰𝑫 = 𝑰𝑺 𝒆 −𝑽𝑫 Τ𝜼𝑽𝑻
−𝟏 𝒆−𝑽𝑫Τ𝜼𝑽𝑻 ⟺
𝒆𝑽Τ𝜼𝑽𝑻
𝑰𝒇 𝑽 ≫ 𝑽𝑻
⇒ 𝒆−𝑽𝑫Τ𝜼𝑽𝑻 ≪ 𝟏
∴ 𝑰 = 𝑰𝑺 [−𝟏]
𝑰𝑫 = 𝑰𝑺 𝒆𝑽𝑫Τ𝜼𝑽𝑻 − 𝟏 1.4
BREAK-DOWN VOLTAGE, 𝑽𝑩𝑹
The lower left quadrant of the graph in the Figure
represents the reverse-bias condition. Notice that only a
very small current flows until the breakdown voltage,
VBR, is reached. The current that flows prior to breakdown
is mainly the result of thermally produced minority
current carriers. This current is called leakage current and
is usually designated IR. Leakage current increases
mainly with temperature and is relatively independent of
changes in reverse-bias voltage. The slight increase in
reverse current, IR, with increases in the reverse voltage,
VR, is a result of surface leakage current. Surface leakage
current exists because there are many holes on the edges
of a silicon crystal due to unfilled covalent bonds. These
holes provide a path for a few electrons along the
surfaces of the crystal.
Avalanche occurs when the reverse-bias voltage, VR, becomes excessive. Thermally produced free
electrons on the p side are accelerated by the voltage source to very high speeds as they move through
the diode. These electrons collide with valence electrons in other orbits. These valence electrons are
also set free and accelerated to very high speeds, thereby dislodging even more valence electrons. The
process is cumulative; hence, we have an avalanche effect. When the breakdown voltage, VBR, is
reached, the reverse current, IR, increases sharply. Diodes should not be operated in the breakdown
region. Most rectifier diodes have breakdown voltages exceeding 50 V.
Example 1.1
If the surface-leakage current is 2 nA for a reverse voltage of 25 V, what is the
surface-leakage current for a reverse voltage of 35 V?
SOLUTION
There are two ways to solve this problem. First, calculate the
surface-leakage resistance:
𝟐𝟓𝑽
𝑹𝑺𝑳 = = 𝟏𝟐. 𝟓 𝟏𝟎𝟗 𝜴
𝟐𝒏𝑨
Then, calculate the surface leakage current as follows:
𝟑𝟓𝑽
𝑰𝑺𝑳 = = 𝟐. 𝟖𝐧𝐀
𝟏𝟐. 𝟓(𝟏𝟎𝟗 )𝜴
Here is a second method, since the surface leakage current is directly proportional to the reverse voltage:
𝟑𝟓𝑽
𝑰𝑺𝑳 = 𝟐𝒏𝑨 = 𝟐. 𝟖𝒏𝑨
𝟐𝟓𝑽